Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NFKB1 | P19838 | 1/20 | 0.33 |
| ▸ | NFKB2 | Q00653 | 1/20 | 0.33 |
| ▸ | RELA | Q04206 | 1/20 | 0.33 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.33 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.30 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
| ▸ | ATM | Q13315 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21711254 | 0.81 | KDM4E (0.36) | HSD17B10MAPK1MEN1KMT2AATM | |
| SCHEMBL12251804 | 0.77 | — | — | |
| SCHEMBL11533080 | 0.77 | CA12 (0.36) | ALOX15MAPTHSD17B10MEN1KMT2A | |
| SCHEMBL12228714 | 0.75 | — | — | |
| SCHEMBL8507944 | 0.74 | CHRNB2 (0.31) | — | |
| SCHEMBL11525930 | 0.74 | ALDH1A1 (0.41) | TP53HSD17B10MAPK1 | |
| SCHEMBL12228707 | 0.73 | HTT (0.33) | TP53HSD17B10MEN1KMT2A | |
| SCHEMBL75668 | 0.72 | — | — | |
| SCHEMBL12228765 | 0.72 | CYP19A1 (0.34) | — | |
| SCHEMBL12228723 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11061328-B2 | Positive tone photosensitive compositions containing amic acid as latent base catalyst | PROMERUS, LLC (US) | 2021-07-13 | — | — | US | claimed |
| US-20200363722-A1 | POSITIVE TONE PHOTOSENSITIVE COMPOSITIONS CONTAINING AMIC ACID AS LATENT BASE CATALYST | PROMERUS, LLC (US) | 2020-11-19 | — | — | US | claimed |
| US-9944730-B2 | Polymers derived from norbornadiene and maleic anhydride and use thereof | PROMERUS, LLC (US) | 2018-04-17 | — | — | US | claimed |
| US-20180044449-A1 | POLYMERS DERIVED FROM NORBORNADIENE AND MALEIC ANHYDRIDE AND USE THEREOF | PROMERUS, LLC (US) | 2018-02-15 | — | — | US | claimed |
| US-9834627-B2 | Polymers derived from norbornadiene and maleic anhydride and use thereof | PROMERUS, LLC (US) | 2017-12-05 | — | — | US | claimed |
| US-20170190810-A1 | POLYMERS DERIVED FROM NORBORNADIENE AND MALEIC ANHYDRIDE AND USE THEREOF | PROMERUS, LLC (US) | 2017-07-06 | — | — | US | claimed |
| US-11061328-B2 | Positive tone photosensitive compositions containing amic acid as latent base catalyst | PROMERUS, LLC (US) | 2021-07-13 | — | — | US | disclosed |
| WO-2020232338-A1 | POSITIVE TONE PHOTOSENSITIVE COMPOSITIONS CONTAINING AMIC ACID AS LATENT BASE CATALYST | PROMERUS, LLC (US) | 2020-11-19 | — | — | WO | disclosed |
| US-20200363722-A1 | POSITIVE TONE PHOTOSENSITIVE COMPOSITIONS CONTAINING AMIC ACID AS LATENT BASE CATALYST | PROMERUS, LLC (US) | 2020-11-19 | — | — | US | disclosed |
| US-9944730-B2 | Polymers derived from norbornadiene and maleic anhydride and use thereof | PROMERUS, LLC (US) | 2018-04-17 | — | — | US | disclosed |
| US-20180044449-A1 | POLYMERS DERIVED FROM NORBORNADIENE AND MALEIC ANHYDRIDE AND USE THEREOF | PROMERUS, LLC (US) | 2018-02-15 | — | — | US | disclosed |
| WO-2017117483-A1 | POLYMERS DERIVED FROM NORBORNADIENE AND MALEIC ANHYDRIDE AND USE THEREOF | PROMERUS, LLC (US) | 2017-07-06 | — | — | WO | disclosed |
| US-8043788-B2 | Alkali soluble resin; immersion lithography | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-10-25 | — | — | US | disclosed |
| US-20090011365-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-01-08 | — | — | US | disclosed |
| US-20090011365-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-01-08 | — | — | US | disclosed |
| US-20080241736-A1 | Immersion lithography; copolymer containing ammonium salt of carboxylic acid and fluorine monomer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-10-02 | — | — | US | disclosed |
| US-20080241736-A1 | Immersion lithography; copolymer containing ammonium salt of carboxylic acid and fluorine monomer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-10-02 | — | — | US | disclosed |
| US-20080096131-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-04-24 | — | — | US | disclosed |
| US-20080096131-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-04-24 | — | — | US | disclosed |
| US-6013413-A | Alicyclic nortricyclene polymers and co-polymers | CORNELL RESEARCH FOUNDATION, INC. (US) | 2000-01-11 | — | — | US | disclosed |