SCHEMBL8050657

SCHEMBL8050657

CCCCC1([O])c2ccccc2-c2ccccc21

nearest known ligand 0.41

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ELANE P08246 1/20 0.41
APEX1 P27695 1/20 0.39
CYP2C9 P11712 2/20 0.39
CYP2C19 P33261 2/20 0.39
NPSR1 Q6W5P4 2/20 0.39
PDK2 Q15119 3/20 0.38
ALOX12 P18054 1/20 0.37
PGR P06401 1/20 0.37
MEN1 O00255 1/20 0.37
RECQL P46063 1/20 0.37
KMT2A Q03164 1/20 0.37
TDP1 Q9NUW8 1/20 0.37
L3MBTL1 Q9Y468 1/20 0.37
CYP2D6 P10635 1/20 0.37
MTTP P55157 1/20 0.36
KDM4E B2RXH2 1/20 0.36
PKM P14618 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8053723 0.88 PGR (0.42) APEX1CYP2C9CYP2C19NPSR1PDK2
SCHEMBL30110388 0.79 APEX1 (0.50) ELANEAPEX1CYP2C9CYP2C19NPSR1
SCHEMBL1394531 0.79 APEX1 (0.50) ELANEAPEX1CYP2C9CYP2C19NPSR1
SCHEMBL8036437 0.79 CYP2D6 (0.41) ELANEAPEX1CYP2C19NPSR1PDK2
SCHEMBL1701331 0.78 THRB (0.47) APEX1TDP1MTTPKDM4EPKM
SCHEMBL28799915 0.78 APEX1 (0.48) ELANEAPEX1CYP2C9CYP2C19NPSR1
Benzene SCHEMBL27655081 0.78 APEX1 (0.53) ELANEAPEX1CYP2C9CYP2C19NPSR1
SCHEMBL27686527 0.78 ALOX12 (0.41) ELANEAPEX1CYP2C9CYP2C19NPSR1
SCHEMBL2763056 0.76 PDK2 (0.44) APEX1CYP2C19PDK2ALOX12KMT2A
SCHEMBL7322958 0.76 CYP1A2 (0.45) APEX1CYP2C19PDK2KMT2ATDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6106999-A SENSITIVITY TO GENERAL-PURPOSE VISIBLE LIGHT LASER, SO THAT HIGH-SPEED SCANNING EXPOSURE IS POSSIBLE BY LASER, AND EXTREMELY FINE HIGH RESOLUTION CAN BE OBTAINED; CAN BE USED FOR COATING OR PRINTING UNDER SAFELIGHT IRRADIATING CONDITIONS MITSUI CHEMICALS (JP) 2000-08-22 US disclosed