SCHEMBL8055747

SCHEMBL8055747

CCN/C(C)=C(/C)C(=O)O

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MMP1 P03956 1/20 0.37
MMP2 P08253 1/20 0.37
MMP3 P08254 1/20 0.37
MMP9 P14780 1/20 0.37
MMP8 P22894 1/20 0.37
KMT2A Q03164 1/20 0.36
THRB P10828 1/20 0.35
FNTA P49354 1/20 0.35
FNTB P49356 1/20 0.35
PGGT1B P53609 1/20 0.35
MCL1 Q07820 1/20 0.34
ALDH1A1 P00352 2/20 0.33
FAAH O00519 1/20 0.33
KDM4E B2RXH2 1/20 0.33
CYP3A4 P08684 1/20 0.33
FFAR3 O14843 2/20 0.32
TDP1 Q9NUW8 1/20 0.32
HTT P42858 1/20 0.30
ALOX15 P16050 1/20 0.30
LCK P06239 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6518333 1.00 MMP1 (0.37) MMP1MMP2MMP3MMP9MMP8
SCHEMBL17499008 1.00 MMP1 (0.37) MMP1MMP2MMP3MMP9MMP8
SCHEMBL3279679 0.80 MMP1 (0.41) MMP1MMP2MMP3MMP9KMT2A
SCHEMBL6448028 0.79 MMP1 (0.37) MMP1MMP2MMP3MMP9MMP8
SCHEMBL6265353 0.75 ALDH1A1 (0.35) MMP1MMP2MMP3MMP9MMP8
SCHEMBL2634811 0.75 ALDH1A1 (0.35) MMP1MMP2MMP3MMP9MMP8
SCHEMBL9451088 0.75 ALDH1A1 (0.35) MMP1MMP2MMP3MMP9MMP8
SCHEMBL3285121 0.75 EPHX1 (0.54) THRBFNTAFNTBPGGT1BFAAH
SCHEMBL23343471 0.74
SCHEMBL3277705 0.73 EPHX1 (0.57) THRBFNTAFNTBPGGT1BALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113214429-B ArF photoresist film-forming resin, preparation method thereof and photoresist composition 广东粤港澳大湾区黄埔材料研究院 2022-04-12 CN disclosed
CN-113214429-A ArF photoresist film-forming resin, preparation method thereof and photoresist composition 中科院长春应化所黄埔先进材料研究院 2021-08-06 CN disclosed
US-6015645-A HAVING HOLE BLOCKING LAYER COMPRISED OF POLYHALOALKYLSTYRENE XEROX CORPORATION (US) 2000-01-18 US disclosed
US-5907001-A Process for the preparation of photopatternable polymers XEROX CORPORATION (US) 1999-05-25 US disclosed