SCHEMBL8058654

SCHEMBL8058654

Cc1cc(O)c(S(=O)(=O)c2ccc(C(C)C)cc2)cc1S(=O)(=O)c1ccc(C(C)C)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.44
GAA P10253 4/20 0.44
PKM P14618 3/20 0.44
LMNA P02545 4/20 0.44
MAPT P10636 3/20 0.44
KDM4E B2RXH2 1/20 0.44
PTGS1 P23219 2/20 0.43
TRPA1 O75762 1/20 0.43
CACNA1C Q13936 1/20 0.43
POLB P06746 1/20 0.43
MEN1 O00255 2/20 0.41
KMT2A Q03164 2/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
PTGS2 P35354 1/20 0.41
CNR2 P34972 1/20 0.40
CA12 O43570 1/20 0.40
CA1 P00915 1/20 0.40
CA2 P00918 1/20 0.40
CA9 Q16790 1/20 0.40
USP2 O75604 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8062026 0.83 GAA (0.54) ALDH1A1GAAPKMLMNAMAPT
SCHEMBL8064345 0.81 POLB (0.53) ALDH1A1GAAPKMLMNAMAPT
SCHEMBL930983 0.80 POLB (0.59) ALDH1A1GAAPKMMAPTPOLB
SCHEMBL8057488 0.79 POLB (0.55) ALDH1A1GAAPKMMAPTKDM4E
SCHEMBL8526579 0.79 POLB (0.55) ALDH1A1GAAPKMMAPTKDM4E
SCHEMBL8062013 0.78 L3MBTL1 (0.58) ALDH1A1GAAPKMMAPTKDM4E
SCHEMBL8062020 0.78 L3MBTL1 (0.58) ALDH1A1GAAPKMMAPTKDM4E
SCHEMBL7774118 0.76 POLB (0.55) ALDH1A1GAAPKMLMNAMAPT
SCHEMBL8046879 0.76 GAA (0.58) ALDH1A1GAAPKMLMNAMAPT
SCHEMBL8047014 0.76 KMT2A (0.51) ALDH1A1GAAPKMMAPTPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6040470-A DERIVATIVES OF 1-ORGANOETHER,-ESTER OR SULFONE-2,4-BIS-PHENYLSULFONYL)BENZENE IN AN AQUEOUS DEVELOPER SLURRY TO PREVENT DETERIORATION OF DISPERSION DUE TO HYDRATION; HIGHLY SENSITIVE; LESS SURFACE BLUSHING; STORAGE STABILITY OF IMAGE SANKO KAIHATSU KAGAKU KENKYUSHO (JP) 2000-03-21 US disclosed
EP-0791578-B1 Sulfonyl compound and thermalsensitive recording medium using the same SANKO KAIHATSU KAGAKU KENK (JP) 1999-11-10 EP disclosed
US-5840652-A HIGH SENSITIVITY, STORAGE STABILITY SANKO KAIHATSU KAGAKU KENKYUSHO (JP) 1998-11-24 US disclosed
EP-0706997-B1 Sulfonyl compound and thermal-sensitive recording medium using the same SANKO KAIHATSU KAGAKU KENK (JP) 1998-03-11 EP disclosed
US-5705452-A AS DEVELOPER; HIGH SENSITIVITY, LOW BACKGROUND BLUSH DURING STORAGE, RESISTANCE TO HEAT, MOISTURE, PLASTICIZER SANKO HAIHATSU KAGAKU KENKYUSHO (JP) 1998-01-06 US disclosed
EP-0791578-A2 Sulfonyl compound and thermalsensitive recording medium using the same Sanko Kaihatsu Kagaku Kenkyusho (JP) 1997-08-27 EP disclosed
EP-0706997-A1 Sulfonyl compound and thermal-sensitive recording medium using the same Sanko Kaihatsu Kagaku Kenkyusho (JP) 1996-04-17 EP disclosed