Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.43 |
| ▸ | MITF | O75030 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.38 |
| ▸ | MAPT | P10636 | 2/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.38 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.38 |
| ▸ | THRB | P10828 | 1/20 | 0.38 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.38 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.38 |
| ▸ | RECQL | P46063 | 1/20 | 0.38 |
| ▸ | BLM | P54132 | 1/20 | 0.38 |
| ▸ | TP53 | P04637 | 2/20 | 0.38 |
| ▸ | STAT6 | P42226 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.38 |
| ▸ | BRD4 | O60885 | 1/20 | 0.34 |
| ▸ | BRD2 | P25440 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL226372 | 0.98 | SMN1; SMN2 (0.45) | LMNASMN1; SMN2MITFKMT2AMAPT | |
| SCHEMBL225584 | 0.98 | SMN1; SMN2 (0.45) | LMNASMN1; SMN2MITFKMT2AMAPT | |
| SCHEMBL93484 | 0.94 | LMNA (0.52) | LMNASMN1; SMN2MITFKMT2AMAPT | |
| SCHEMBL12764294 | 0.86 | ITGB1 (0.38) | LMNAKMT2AMAPTKDM4EMEN1 | |
| SCHEMBL7277181 | 0.82 | LMNA (0.45) | LMNASMN1; SMN2MITFKMT2AMAPT | |
| SCHEMBL8379227 | 0.81 | LMNA (0.54) | LMNASMN1; SMN2MITFKMT2AMAPT | |
| SCHEMBL6822537 | 0.80 | SMN1; SMN2 (0.45) | LMNASMN1; SMN2MITFKMT2AMAPT | |
| SCHEMBL641600 | 0.79 | LMNA (0.52) | LMNASMN1; SMN2MITFKMT2AMAPT | |
| SCHEMBL15061902 | 0.78 | SMN1; SMN2 (0.50) | LMNASMN1; SMN2MITFKMT2AMAPT | |
| SCHEMBL15061890 | 0.78 | SMN1; SMN2 (0.50) | LMNASMN1; SMN2MITFKMT2AMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2753650-B1 | POLYMERIC AGENTS THAT IMPROVE PRIMARY WASHING EFFICIENCY | HENKEL AG & CO KGAA (DE) | 2020-04-08 | — | — | EP | claimed |
| US-20140187461-A1 | POLYMERIC AGENTS THAT IMPROVE PRIMARY WASHING EFFICIENCY | FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V. (DE) | 2014-07-03 | — | — | US | claimed |
| WO-2013034437-A1 | POLYMERIC AGENTS THAT IMPROVE PRIMARY WASHING EFFICIENCY | HENKEL AG & CO. KGAA (DE) | 2013-03-14 | — | — | WO | claimed |
| US-20260092190-A1 | Radiation Curable Ink Composition For Ink Jet And Recording Apparatus | SEIKO EPSON CORP (JP) | 2026-04-02 | — | — | US | disclosed |
| WO-2025089385-A1 | INK COMPOSITION | 大日本塗料株式会社 | 2025-05-01 | — | — | WO | disclosed |
| WO-2024070789-A1 | ADHESIVE AND ADHESIVE SHEET | 日東電工株式会社 | 2024-04-04 | — | — | WO | disclosed |
| WO-2024070788-A1 | ADHESIVE AND ADHESIVE SHEET | 日東電工株式会社 | 2024-04-04 | — | — | WO | disclosed |
| CN-110462797-B | Polishing composition | 福吉米株式会社 | 2023-09-22 | — | — | CN | disclosed |
| WO-2022210740-A1 | INK COMPOSITION FOR FORMING SURFACE-PROTECTING LAYERS | 大日本塗料株式会社 | 2022-10-06 | — | — | WO | disclosed |
| US-20220145105-A1 | ELECTRON BEAM-CURABLE PRINTING INK COMPOSITION AND ELECTRON BEAM-CURABLE OVERPRINT VARNISH COMPOSITION | SAKATA INX CORPORATION (JP) | 2022-05-12 | — | — | US | disclosed |
| CN-109554018-B | Inkjet composition set and inkjet recording method | 精工爱普生株式会社 | 2022-04-15 | — | — | CN | disclosed |
| US-20150111043-A1 | Anti-Fogging Film-Forming Material, Coating Liquid for Forming Anti-Fogging Film, Anti-Fogging Article, and Methods for Producing These | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-04-23 | — | — | US | disclosed |
| US-20140187461-A1 | POLYMERIC AGENTS THAT IMPROVE PRIMARY WASHING EFFICIENCY | FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V. (DE) | 2014-07-03 | — | — | US | disclosed |
| US-20140038105-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-02-06 | — | — | US | disclosed |
| US-20140038105-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-02-06 | — | — | US | disclosed |
| WO-2013034437-A1 | POLYMERIC AGENTS THAT IMPROVE PRIMARY WASHING EFFICIENCY | HENKEL AG & CO. KGAA (DE) | 2013-03-14 | — | — | WO | disclosed |
| US-20110053082-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-03 | — | — | US | disclosed |
| US-20110053082-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-03 | — | — | US | disclosed |
| EP-1018536-A1 | LUMINESCENT PLASTIC MATERIAL AND PROCESS FOR PRODUCING THE SAME | KUREHA KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 2000-07-12 | — | — | EP | disclosed |
| EP-0927745-A1 | OPTICAL PLASTIC MATERIAL AND PROCESS FOR THE PRODUCTION THEREOF | KUREHA KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1999-07-07 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260092190-A1 | Radiation Curable Ink Composition For Ink Jet And Recording Apparatus | KAT8, TAS2R8, NLRP3 | LMNA 4561/4885SMN1; SMN2 2067/4885MITF 1889/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.