Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PPARG | P37231 | 3/20 | 0.34 |
| ▸ | PPARA | Q07869 | 3/20 | 0.34 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.34 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.34 |
| ▸ | PPARD | Q03181 | 1/20 | 0.34 |
| ▸ | ENPP1 | P22413 | 1/20 | 0.30 |
| ▸ | SCN9A | Q15858 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3132308 | 0.87 | HDAC4 (0.41) | CYP2C19ENPP1 | |
| Sulfuric Acid SCHEMBL15345275 | 0.87 | PPARG (0.37) | PPARGPPARACYP2C9CYP2C19PPARD | |
| SCHEMBL8320148 | 0.87 | PPARA (0.39) | PPARGPPARACYP2C9CYP2C19PPARD | |
| Trifluoromethanesulfonic Acid SCHEMBL216880 | 0.86 | PPARG (0.36) | PPARGPPARACYP2C9CYP2C19PPARD | |
| SCHEMBL3136649 | 0.85 | HDAC11 (0.36) | — | |
| SCHEMBL8645080 | 0.84 | PTPN1 (0.44) | CYP2C9CYP2C19 | |
| SCHEMBL3135501 | 0.83 | PTGS2 (0.42) | ENPP1 | |
| SCHEMBL3136615 | 0.83 | PTGS2 (0.39) | ENPP1 | |
| SCHEMBL246926 | 0.83 | PPARG (0.38) | PPARGPPARACYP2C9CYP2C19PPARD | |
| SCHEMBL3127195 | 0.82 | MAPT (0.36) | SCN9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6106993-A | HIGHLY SENSITIVE TO ACTINIC RADIATION SUCH AS DEEP-UV, ELECTRON BEAM AND X-RAY, CAN BE DEVELOPED WITH ALKALINE AQUEOUS SOLUTION TO FORM A PATTERN, AND IS THUS SUITABLE FOR USE IN A FINE PATTERNING TECHNIQUE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-08-22 | — | — | US | disclosed |
| US-5824824-A | AROMATIC SULFONATE ANIONS AND DISSOLUTION CONTRAST IN EXPOSED AND NONEXPOSED AREAS, POSITIVE RESISTS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1998-10-20 | — | — | US | disclosed |