Known targets — ChEMBL curated mechanism
ACHECHRM1CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNG
The experimentally established mechanism targets of Dipyridyl. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 9/20 | 0.88 |
| ▸ | LMNA | P02545 | 3/20 | 0.88 |
| ▸ | CCR1 | P32246 | 3/20 | 0.88 |
| ▸ | CCR5 | P51681 | 3/20 | 0.88 |
| ▸ | CCR8 | P51685 | 3/20 | 0.88 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.88 |
| ▸ | POLB | P06746 | 1/20 | 0.88 |
| ▸ | METAP1 | P53582 | 1/20 | 0.88 |
| ▸ | BLM | P54132 | 1/20 | 0.88 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.88 |
| ▸ | DOHH | Q9BU89 | 1/20 | 0.88 |
| ▸ | P4HTM | Q9NXG6 | 1/20 | 0.88 |
| ▸ | NPC1 | O15118 | 6/20 | 0.70 |
| ▸ | TP53 | P04637 | 4/20 | 0.70 |
| ▸ | RAB9A | P51151 | 4/20 | 0.70 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.70 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.70 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.70 |
| ▸ | HTT | P42858 | 2/20 | 0.70 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.70 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Dipyridyl SCHEMBL7900008 | 0.97 | KDM4E (0.93) | KDM4ELMNACCR1CCR5CCR8 | |
| Dipyridyl SCHEMBL28299710 | 0.97 | KDM4E (0.93) | KDM4ELMNACCR1CCR5CCR8 | |
| Dipyridyl SCHEMBL11515039 | 0.97 | KDM4E (0.93) | KDM4ELMNACCR1CCR5CCR8 | |
| Dipyridyl SCHEMBL287597 | 0.97 | KDM4E (0.93) | KDM4ELMNACCR1CCR5CCR8 | |
| Dipyridyl SCHEMBL1535115 | 0.97 | KDM4E (0.93) | KDM4ELMNACCR1CCR5CCR8 | |
| Dipyridyl SCHEMBL28812305 | 0.97 | KDM4E (0.93) | KDM4ELMNACCR1CCR5CCR8 | |
| Dipyridyl SCHEMBL2207183 | 0.94 | KDM4E (0.88) | KDM4ELMNACCR1CCR5CCR8 | |
| Dipyridyl SCHEMBL7904091 | 0.94 | KDM4E (0.88) | KDM4ELMNACCR1CCR5CCR8 | |
| Dipyridyl SCHEMBL809361 | 0.94 | KDM4E (0.88) | KDM4ELMNACCR1CCR5CCR8 | |
| Dipyridyl SCHEMBL286888 | 0.94 | KDM4E (0.88) | KDM4ELMNACCR1CCR5CCR8 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109096149-B | Process for the preparation of beta-arylamines | 富兰克科技（深圳）股份有限公司 | 2021-02-26 | — | — | CN | disclosed |
| EP-1845122-B1 | POLYARYLENE, PROCESS FOR PRODUCING THE SAME, SOLID POLYELECTROLYTE, AND PROTON-CONDUCTIVE FILM | JSR CORP (JP) | 2011-11-16 | — | — | EP | disclosed |
| US-7893303-B2 | Polyarylene, process for producing the same, solid polyelectrolyte, and proton-conductive film | JSR CORPORATION (JP) | 2011-02-22 | — | — | US | disclosed |
| US-7556860-B2 | Laminate and method of forming the same, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2009-07-07 | — | — | US | disclosed |
| EP-1245638-B1 | Composition for insulating film formation | JSR CORP (JP) | 2009-01-14 | — | — | EP | disclosed |
| US-20080015389-A1 | Polyarylene, Process For Producing The Same, Solid Polyelectrolyte, And Proton-Conductive Film | JSR CORPORATION (JP) | 2008-01-17 | — | — | US | disclosed |
| EP-1188807-B1 | Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing | JSR CORP (JP) | 2007-10-17 | — | — | EP | disclosed |
| EP-1845122-A1 | POLYARYLENE, PROCESS FOR PRODUCING THE SAME, SOLID POLYELECTROLYTE, AND PROTON-CONDUCTIVE FILM | JSR Corporation (JP) | 2007-10-17 | — | — | EP | disclosed |
| EP-1298176-B1 | Stacked film insulating film and substrate for semiconductor | JSR CORP (JP) | 2007-01-03 | — | — | EP | disclosed |
| US-7153767-B2 | Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing | JSR CORPORATION (JP) | 2006-12-26 | — | — | US | disclosed |
| US-6812290-B2 | FOR USE AS ELECTROLYTES | JSR CORPORATION (JP) | 2004-11-02 | — | — | US | disclosed |
| US-20030195301-A1 | Polyarylene copolymers and proton-conductive membrane | JSR CORPORATION (JP) | 2003-10-16 | — | — | US | disclosed |
| US-6555626-B2 | Controlled amount of sulfonic acid groups; copolymer of an aromatic compound having a main chain containing electron withdrawing groups and aromatic compounds with no electron withdrawing groups; durability, strength, conductivity | JSR CORPORATION (JP) | 2003-04-29 | — | — | US | disclosed |
| US-20030077461-A1 | Stacked film, insulating film and substrate for semiconductor | JSR CORPORATION (JP) | 2003-04-24 | — | — | US | disclosed |
| EP-1298176-A2 | Stacked film insulating film and substrate for semiconductor | JSR Corporation (JP) | 2003-04-02 | — | — | EP | disclosed |
| US-20020172652-A1 | Composition for film formation and material for insulating film formation | JSR CORPORATION (JP) | 2002-11-21 | — | — | US | disclosed |
| EP-1245638-A1 | Composition for insulating film formation | JSR Corporation (JP) | 2002-10-02 | — | — | EP | disclosed |
| US-20020064953-A1 | Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing | JSR CORPORATION (JP) | 2002-05-30 | — | — | US | disclosed |
| US-20010037000-A1 | Polyarylene copolymers and proton-conductive membrane | JSR CORPORATION (JP) | 2001-11-01 | — | — | US | disclosed |
| EP-1138712-A2 | Polyarylene copolymers and proton-conductive membrane | JSR Corporation (JP) | 2001-10-04 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080015389-A1 | Polyarylene, Process For Producing The Same, Solid Polyelectrolyte, And Proton-Conductive Film | PARG, PUF60, PARN | KDM4E 1846/4885LMNA 2404/4885CCR1 1262/4885 |
| US-20020172652-A1 | Composition for film formation and material for insulating film formation | VCL, BMI1, PUF60 | KDM4E 318/4885LMNA 1305/4885CCR1 3954/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.