Known targets — ChEMBL curated mechanism
ABL1ACEACHEACVR1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALKAVPR1AAVPR2BCHEBCRCA2CACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCASRCCR5CDK4CDK6CFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNA3CHRNA7CHRNB1CHRNB4CHRNDCHRNECHRNGCOXFA4COXFA4L2CRBNCSF1RCUL4ACYP19A1DDB1DPP4DRD1DRD2DRD3DRD4EDNRAEGFREML4ERBB2ERBB4ESR1ESR2FGFR1FGFR3FLT1FLT3FLT4GAAGABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGHSRGLAGNRHRGPD2GRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BGSTP1HCN4HCRTR1HCRTR2HDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HRH2HRH3HSD11B1HSP90AA1HSP90AB1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IMPDH1IMPDH2ITGA2BITGB3ITKJAK1JAK2KCNA1KCNA10KCNA2KCNA3KCNA4KCNA5KCNA6KCNA7KCNB1KCNB2KCNC1KCNC2KCNC3KCNC4KCND1KCND2KCND3KCNF1KCNG1KCNG2KCNG3KCNG4KCNH1KCNH2KCNH3KCNH4KCNH5KCNH6KCNH7KCNH8KCNJ2KCNJ3KCNJ5KCNK3KCNK9KCNQ1KCNQ2KCNQ3KCNQ4KCNQ5KCNS1KCNS2KCNS3KCNV1KCNV2KDRKITKLKB1LCKMMAOAMAOBMAPK14METMMP1MMP13MMP7MMP8MT-ND1MT-ND2MT-ND3MT-ND4MT-ND4LMT-ND5MT-ND6NDUFA1NDUFA10NDUFA11NDUFA12NDUFA13NDUFA2NDUFA3NDUFA5NDUFA6NDUFA7NDUFA8NDUFA9NDUFAB1NDUFAF1NDUFAF2NDUFAF3NDUFAF4NDUFB1NDUFB10NDUFB11NDUFB2NDUFB3NDUFB4NDUFB5NDUFB6NDUFB7NDUFB8NDUFB9NDUFC1NDUFC2NDUFS1NDUFS2NDUFS3NDUFS4NDUFS5NDUFS6NDUFS7NDUFS8NDUFV1NDUFV2NDUFV3NR3C1NS5ANTRK1NTRK2NTRK3ODC1OPRD1OPRK1OPRM1P2RY12PAHPARP1PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDE5APDE7APDE7BPDE8APDE8BPDGFRAPDGFRBPIK3CAPIK3CDPNPPOLA1POLA2POLD1POLD2POLD3POLD4POLEPOLE2POLE3PPARGPRIM1PRIM2PRKCAPRKCBPRKCDPRKCEPRKCGPRKCHPRKCIPRKCQPRKCZPRKD1PRKD3PTGS1PTGS2RBX1RENRETROCK1ROCK2RPE65RRM1RRM2RRM2BS1PR1S1PR2S1PR3S1PR4S1PR5SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC18A2SLC6A1SLC6A2SLC6A3SLC6A4SLC9A3SRCTACR1TOP1TOP2ATOP2BTTRTYMPdacAdacBdacCembAfolAftsIgyrAgyrBmrcAmrcBmrdAparCparEpolrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Dipyridyl. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CCR5 known ✓ | P51681 | 3/20 | 0.88 |
| ▸ | HSP90AA1 known ✓ | P07900 | 1/20 | 0.70 |
| ▸ | GLA known ✓ | P06280 | 1/20 | 0.59 |
| ▸ | CYP19A1 known ✓ | P11511 | 1/20 | 0.48 |
| ▸ | KDM4E | B2RXH2 | 9/20 | 0.88 |
| ▸ | LMNA | P02545 | 3/20 | 0.88 |
| ▸ | CCR1 | P32246 | 3/20 | 0.88 |
| ▸ | CCR8 | P51685 | 3/20 | 0.88 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.88 |
| ▸ | POLB | P06746 | 1/20 | 0.88 |
| ▸ | METAP1 | P53582 | 1/20 | 0.88 |
| ▸ | BLM | P54132 | 1/20 | 0.88 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.88 |
| ▸ | DOHH | Q9BU89 | 1/20 | 0.88 |
| ▸ | P4HTM | Q9NXG6 | 1/20 | 0.88 |
| ▸ | NPC1 | O15118 | 6/20 | 0.70 |
| ▸ | TP53 | P04637 | 4/20 | 0.70 |
| ▸ | RAB9A | P51151 | 4/20 | 0.70 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.70 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.70 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Dipyridyl SCHEMBL2207183 | 1.00 | KDM4E (0.88) | KDM4ELMNACCR1CCR5CCR8 | |
| Dipyridyl SCHEMBL287597 | 0.97 | KDM4E (0.93) | KDM4ELMNACCR1CCR5CCR8 | |
| Dipyridyl SCHEMBL7900008 | 0.97 | KDM4E (0.93) | KDM4ELMNACCR1CCR5CCR8 | |
| Dipyridyl SCHEMBL1535115 | 0.97 | KDM4E (0.93) | KDM4ELMNACCR1CCR5CCR8 | |
| Dipyridyl SCHEMBL1450622 | 0.97 | KDM4E (0.93) | KDM4ELMNACCR1CCR5CCR8 | |
| Dipyridyl SCHEMBL4263105 | 0.97 | KDM4E (0.93) | KDM4ELMNACCR1CCR5CCR8 | |
| Dipyridyl SCHEMBL4220617 | 0.97 | KDM4E (0.93) | KDM4ELMNACCR1CCR5CCR8 | |
| Dipyridyl SCHEMBL10395611 | 0.97 | KDM4E (0.93) | KDM4ELMNACCR1CCR5CCR8 | |
| Dipyridyl SCHEMBL6795069 | 0.97 | KDM4E (0.93) | KDM4ELMNACCR1CCR5CCR8 | |
| Dipyridyl SCHEMBL501755 | 0.97 | KDM4E (0.93) | KDM4ELMNACCR1CCR5CCR8 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2026103790-A1 | NAPHTHYRIDINE DERIVATIVE AND PREPARATION METHOD THEREFOR | 江苏豪森药业集团有限公司 | 2026-05-21 | — | — | WO | claimed |
| WO-2026103790-A1 | NAPHTHYRIDINE DERIVATIVE AND PREPARATION METHOD THEREFOR | 江苏豪森药业集团有限公司 | 2026-05-21 | — | — | WO | disclosed |
| EP-1845122-B1 | POLYARYLENE, PROCESS FOR PRODUCING THE SAME, SOLID POLYELECTROLYTE, AND PROTON-CONDUCTIVE FILM | JSR CORP (JP) | 2011-11-16 | — | — | EP | disclosed |
| US-7893303-B2 | Polyarylene, process for producing the same, solid polyelectrolyte, and proton-conductive film | JSR CORPORATION (JP) | 2011-02-22 | — | — | US | disclosed |
| US-7556860-B2 | Laminate and method of forming the same, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2009-07-07 | — | — | US | disclosed |
| EP-1245638-B1 | Composition for insulating film formation | JSR CORP (JP) | 2009-01-14 | — | — | EP | disclosed |
| US-20080015389-A1 | Polyarylene, Process For Producing The Same, Solid Polyelectrolyte, And Proton-Conductive Film | JSR CORPORATION (JP) | 2008-01-17 | — | — | US | disclosed |
| EP-1188807-B1 | Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing | JSR CORP (JP) | 2007-10-17 | — | — | EP | disclosed |
| EP-1845122-A1 | POLYARYLENE, PROCESS FOR PRODUCING THE SAME, SOLID POLYELECTROLYTE, AND PROTON-CONDUCTIVE FILM | JSR Corporation (JP) | 2007-10-17 | — | — | EP | disclosed |
| EP-1312605-B1 | Method for producing biaryl compounds | SUMITOMO CHEMICAL CO (JP) | 2007-04-25 | — | — | EP | disclosed |
| EP-1312605-A1 | Method for producing biaryl compounds | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-05-21 | — | — | EP | disclosed |
| US-6555626-B2 | Controlled amount of sulfonic acid groups; copolymer of an aromatic compound having a main chain containing electron withdrawing groups and aromatic compounds with no electron withdrawing groups; durability, strength, conductivity | JSR CORPORATION (JP) | 2003-04-29 | — | — | US | disclosed |
| US-20030077461-A1 | Stacked film, insulating film and substrate for semiconductor | JSR CORPORATION (JP) | 2003-04-24 | — | — | US | disclosed |
| EP-1298176-A2 | Stacked film insulating film and substrate for semiconductor | JSR Corporation (JP) | 2003-04-02 | — | — | EP | disclosed |
| US-20020172652-A1 | Composition for film formation and material for insulating film formation | JSR CORPORATION (JP) | 2002-11-21 | — | — | US | disclosed |
| EP-1245638-A1 | Composition for insulating film formation | JSR Corporation (JP) | 2002-10-02 | — | — | EP | disclosed |
| US-20020064953-A1 | Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing | JSR CORPORATION (JP) | 2002-05-30 | — | — | US | disclosed |
| EP-1188807-A2 | Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing | JSR Corporation (JP) | 2002-03-20 | — | — | EP | disclosed |
| US-20010037000-A1 | Polyarylene copolymers and proton-conductive membrane | JSR CORPORATION (JP) | 2001-11-01 | — | — | US | disclosed |
| EP-1138712-A2 | Polyarylene copolymers and proton-conductive membrane | JSR Corporation (JP) | 2001-10-04 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080015389-A1 | Polyarylene, Process For Producing The Same, Solid Polyelectrolyte, And Proton-Conductive Film | PARG, PUF60, PARN | CCR5 3071/4885HSP90AA1 3701/4885GLA 3663/4885 |
| US-20020172652-A1 | Composition for film formation and material for insulating film formation | VCL, BMI1, PUF60 | CCR5 3968/4885HSP90AA1 1763/4885GLA 4415/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.