SCHEMBL8097347

SCHEMBL8097347

CCCCC(CO)S[Si](C)(C)C

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.41
LMNA P02545 2/20 0.37
CYP2D6 P10635 2/20 0.31
SPHK1 Q9NYA1 1/20 0.31
GMNN O75496 1/20 0.31
POLB P06746 1/20 0.31
THPO P40225 1/20 0.31
MTOR P42345 1/20 0.31
BLM P54132 1/20 0.31
KDM4E B2RXH2 1/20 0.31
TP53 P04637 1/20 0.31
CYP1A2 P05177 1/20 0.31
CYP3A4 P08684 1/20 0.31
MAPT P10636 1/20 0.31
CETP P11597 1/20 0.31
HTT P42858 1/20 0.31
UBE2N P61088 1/20 0.31
FDPS P14324 1/20 0.31
DNM1 Q05193 2/20 0.31
TSHR P16473 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5065489 0.75
SCHEMBL15068203 0.73 ALDH1A1 (0.44) ALDH1A1LMNACYP2D6SPHK1GMNN
SCHEMBL3813457 0.68 LMNA (0.56) ALDH1A1LMNACYP2D6SPHK1GMNN
SCHEMBL6066233 0.68 LMNA (0.56) ALDH1A1LMNACYP2D6SPHK1GMNN
SCHEMBL11767736 0.68 LMNA (0.56) ALDH1A1LMNACYP2D6SPHK1GMNN
SCHEMBL18425060 0.68 LMNA (0.56) ALDH1A1LMNACYP2D6SPHK1GMNN
SCHEMBL15150999 0.67 LMNA (0.54) ALDH1A1LMNACYP2D6SPHK1GMNN
SCHEMBL10788167 0.65 LMNA (0.52) ALDH1A1LMNACYP2D6SPHK1GMNN
SCHEMBL10772156 0.65 DNM1 (0.43) ALDH1A1LMNACYP3A4FDPSDNM1
SCHEMBL7797214 0.64 LMNA (0.50) ALDH1A1LMNACYP2D6SPHK1GMNN

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0700951-B1 Polyorganosiloxane and process for producing the same SHOWA DENKO KK (JP) 2000-12-27 EP disclosed
EP-0700951-A1 Polyorganosiloxane and process for producing the same SHOWA DENKO KABUSHIKI KAISHA (JP) 1996-03-13 EP disclosed
US-5491203-A COMPRISES POLYSILSESQUIOXANE STRUCTURE; HAS METHYL GROUP AND A REACTIVE GROUP ON SIDE CHAINS; SUITABLE AS POLYMER MODIFIER; CROSSLINKING; COATINGS SHOWA DENKO K. K. (JP) 1996-02-13 US disclosed