SCHEMBL81224

SCHEMBL81224

ClC(Cl)(Cl)c1nc(Sc2ccccc2)nc(C(Cl)(Cl)Cl)n1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CXCL12 P48061 1/20 0.43
CCNB2 O95067 2/20 0.37
CCNE2 O96020 2/20 0.37
CDK1 P06493 2/20 0.37
CDK4 P11802 2/20 0.37
CCNB1 P14635 2/20 0.37
CCND1 P24385 2/20 0.37
CCNE1 P24864 2/20 0.37
CDK2 P24941 2/20 0.37
CCNB3 Q8WWL7 2/20 0.37
CCNA2 P20248 1/20 0.37
CCNA1 P78396 1/20 0.37
HPGD P15428 3/20 0.35
HTT P42858 2/20 0.35
MAPT P10636 4/20 0.35
LMNA P02545 2/20 0.35
ALDH1A1 P00352 2/20 0.35
KDM4E B2RXH2 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
TSHR P16473 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28814940 0.81 NPC1 (0.37) HPGDMAPTLMNAALDH1A1L3MBTL1
SCHEMBL25424200 0.80 CXCL12 (0.43) CXCL12CCNE2CDK4CCND1CCNE1
SCHEMBL9622211 0.78 ABCG2 (0.42) HPGDHTTMAPTLMNAALDH1A1
SCHEMBL13270539 0.74 ABCG2 (0.40) HPGDHTTMAPTLMNAALDH1A1
SCHEMBL17795952 0.72 CXCL12 (0.52) CXCL12HPGDHTTMAPTLMNA
SCHEMBL6847060 0.72 CXCL12 (0.47) CXCL12HPGDHTTMAPTLMNA
SCHEMBL15453731 0.72 CXCL12 (0.44) CXCL12HPGDHTTMAPTLMNA
SCHEMBL82196 0.72 RAB9A (0.54) HPGDHTTMAPTALDH1A1L3MBTL1
SCHEMBL12102886 0.71 CXCL12 (0.46) CXCL12HPGDHTTMAPTLMNA
SCHEMBL8075774 0.70 CXCL12 (0.53) CXCL12HPGDHTTMAPTLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 558 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0557555-B1 Photopolymerizable composition MITSUBISHI CHEM CORP (JP) 1995-09-20 EP claimed
EP-0557555-A1 Photopolymerizable composition Mitsubishi Chemical Corporation (JP) 1993-09-01 EP claimed
US-5219709-A Addition polymerizable unsaturated compound, photoinitiator system of squarylium dye and halomethyl-s-triazine compound MITSUBISHI KASEI CORPORATION (JP) 1993-06-15 US claimed
EP-0379200-A2 Photopolymerizable composition MITSUBISHI KASEI CORPORATION (JP) 1990-07-25 EP claimed
US-12422750-B2 Method of manufacturing cured film, photocurable resin composition, method of manufacturing laminate, and method of manufacturing semiconductor device FUJIFILM CORPORATION (JP) 2025-09-23 US disclosed
CN-116648313-B Resin composition, cured product, laminate, method for producing cured product, and semiconductor device 富士胶片株式会社 2025-05-16 CN disclosed
CN-119937247-A Curable resin composition, resin film, cured film, laminate, method for producing cured film, and semiconductor device 富士胶片株式会社 2025-05-06 CN disclosed
CN-115190891-B Curable resin composition, cured film, laminate, method for producing cured film, and semiconductor device 富士胶片株式会社 2024-10-15 CN disclosed
CN-111566560-B Photosensitive resin composition, partition wall, organic electroluminescent element, image display device, and illumination 三菱化学株式会社 2024-09-17 CN disclosed
CN-114981360-B Curable resin composition, cured film, laminate, method for producing cured film, and semiconductor device 富士胶片株式会社 2024-09-10 CN disclosed
CN-115667404-B Curable resin composition, cured film, laminate, method for producing cured film, and semiconductor device 富士胶片株式会社 2024-05-03 CN disclosed
CN-117378044-A Polyimide-containing part forming composition, method for producing bonded body, method for producing device, and device 富士胶片株式会社 2024-01-09 CN disclosed
US-20020177071-A1 Method for forming image and apparatus for forming image MITSUBISHI CHEMICAL CORPORATION (JP) 2002-11-28 US disclosed
EP-1243412-A1 Method for forming image and apparatus for forming image MITSUBISHI CHEMICAL CORPORATION (JP) 2002-09-25 EP disclosed
US-20020114966-A1 Photopolymerizable composition and photopolmerizable lithographic printing plate MITSUBISHI CHEMICAL CORPORATION (JP) 2002-08-22 US disclosed
US-6153356-A MIXTURE OF UNSATURATED COMPOUND, CYANINE DYE AND PHOTOINITIATOR MITSUBISHI CHEMICAL CORPORATION (JP) 2000-11-28 US disclosed
EP-0557555-B1 Photopolymerizable composition MITSUBISHI CHEM CORP (JP) 1995-09-20 EP disclosed
EP-0557555-A1 Photopolymerizable composition Mitsubishi Chemical Corporation (JP) 1993-09-01 EP disclosed
US-5219709-A Addition polymerizable unsaturated compound, photoinitiator system of squarylium dye and halomethyl-s-triazine compound MITSUBISHI KASEI CORPORATION (JP) 1993-06-15 US disclosed
EP-0379200-A2 Photopolymerizable composition MITSUBISHI KASEI CORPORATION (JP) 1990-07-25 EP disclosed