SCHEMBL82196

SCHEMBL82196

ClC(Cl)(Cl)c1nc(SCc2ccccc2)nc(C(Cl)(Cl)Cl)n1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RAB9A P51151 6/20 0.54
SMN1; SMN2 Q16637 4/20 0.54
NPC1 O15118 3/20 0.54
HSD17B10 Q99714 1/20 0.52
HSP90AA1 P07900 1/20 0.49
ALOX15 P16050 2/20 0.46
ALDH1A1 P00352 2/20 0.45
CYP1A2 P05177 2/20 0.45
CYP3A4 P08684 1/20 0.45
MAPT P10636 1/20 0.45
HIF1A Q16665 1/20 0.45
CTSB P07858 5/20 0.45
TOP2A P11388 2/20 0.45
HPGD P15428 2/20 0.44
PAK4 O96013 1/20 0.44
MEN1 O00255 1/20 0.44
CYP2C9 P11712 1/20 0.44
CYP2C19 P33261 1/20 0.44
PPARG P37231 1/20 0.44
HTT P42858 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11890163 0.89 RAB9A (0.45) RAB9ASMN1; SMN2NPC1HSD17B10HSP90AA1
SCHEMBL13752162 0.80 RAB9A (0.70) RAB9ASMN1; SMN2NPC1HSD17B10HSP90AA1
SCHEMBL5888974 0.76 RAB9A (0.59) RAB9ASMN1; SMN2NPC1HSD17B10HSP90AA1
SCHEMBL489903 0.74 RAB9A (0.62) RAB9ASMN1; SMN2NPC1HSD17B10HSP90AA1
SCHEMBL81224 0.72 CXCL12 (0.43) SMN1; SMN2HSD17B10ALDH1A1CYP1A2MAPT
SCHEMBL14589691 0.72 CALM1 (0.42) RAB9ANPC1ALDH1A1CYP1A2CYP3A4
SCHEMBL11615149 0.72 RAB9A (0.59) RAB9ASMN1; SMN2NPC1HSD17B10HSP90AA1
SCHEMBL28853540 0.71 RAB9A (0.64) RAB9ASMN1; SMN2NPC1HSD17B10HSP90AA1
SCHEMBL10975367 0.70 HSD17B10 (0.66) RAB9ASMN1; SMN2NPC1HSD17B10HSP90AA1
SCHEMBL5450296 0.70 RAB9A (0.68) RAB9ASMN1; SMN2NPC1HSD17B10HSP90AA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 555 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12422750-B2 Method of manufacturing cured film, photocurable resin composition, method of manufacturing laminate, and method of manufacturing semiconductor device FUJIFILM CORPORATION (JP) 2025-09-23 US disclosed
CN-116648313-B Resin composition, cured product, laminate, method for producing cured product, and semiconductor device 富士胶片株式会社 2025-05-16 CN disclosed
CN-119937247-A Curable resin composition, resin film, cured film, laminate, method for producing cured film, and semiconductor device 富士胶片株式会社 2025-05-06 CN disclosed
CN-115190891-B Curable resin composition, cured film, laminate, method for producing cured film, and semiconductor device 富士胶片株式会社 2024-10-15 CN disclosed
CN-114981360-B Curable resin composition, cured film, laminate, method for producing cured film, and semiconductor device 富士胶片株式会社 2024-09-10 CN disclosed
CN-115667404-B Curable resin composition, cured film, laminate, method for producing cured film, and semiconductor device 富士胶片株式会社 2024-05-03 CN disclosed
CN-117378044-A Polyimide-containing part forming composition, method for producing bonded body, method for producing device, and device 富士胶片株式会社 2024-01-09 CN disclosed
CN-117203746-A Method for manufacturing bonded body, method for manufacturing semiconductor device, and resin composition 富士胶片株式会社 2023-12-08 CN disclosed
CN-117120550-A Resin composition, cured product, laminate, method for producing cured product, and semiconductor device 富士胶片株式会社 2023-11-24 CN disclosed
CN-117043273-A Resin composition, cured product, laminate, method for producing cured product, and semiconductor device 富士胶片株式会社 2023-11-10 CN disclosed
US-20030172828-A1 Regenerative plate making and printing process, and plate making and printing apparatus MITSUBISHI HEAVY INDUSTRIES PRINTING & PACKAGING MACHINERY, LTD. (JP) 2003-09-18 US disclosed
EP-1287986-A1 METHOD AND DEVICE FOR REGENERATIVE PROCESSING AND PRINTING MITSUBISHI CHEMICAL CORPORATION (JP) 2003-03-05 EP disclosed
US-20020177071-A1 Method for forming image and apparatus for forming image MITSUBISHI CHEMICAL CORPORATION (JP) 2002-11-28 US disclosed
EP-1243412-A1 Method for forming image and apparatus for forming image MITSUBISHI CHEMICAL CORPORATION (JP) 2002-09-25 EP disclosed
US-20020114966-A1 Photopolymerizable composition and photopolmerizable lithographic printing plate MITSUBISHI CHEMICAL CORPORATION (JP) 2002-08-22 US disclosed
US-6153356-A MIXTURE OF UNSATURATED COMPOUND, CYANINE DYE AND PHOTOINITIATOR MITSUBISHI CHEMICAL CORPORATION (JP) 2000-11-28 US disclosed
EP-0557555-B1 Photopolymerizable composition MITSUBISHI CHEM CORP (JP) 1995-09-20 EP disclosed
EP-0557555-A1 Photopolymerizable composition Mitsubishi Chemical Corporation (JP) 1993-09-01 EP disclosed
US-5219709-A Addition polymerizable unsaturated compound, photoinitiator system of squarylium dye and halomethyl-s-triazine compound MITSUBISHI KASEI CORPORATION (JP) 1993-06-15 US disclosed
EP-0379200-A2 Photopolymerizable composition MITSUBISHI KASEI CORPORATION (JP) 1990-07-25 EP disclosed