SCHEMBL8153407

SCHEMBL8153407

Cc1ccc(S(=O)(=O)ONc2cccc3ccccc23)cc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.52
KEAP1 Q14145 3/20 0.47
RAB9A P51151 1/20 0.47
LMNA P02545 4/20 0.46
NFE2L2 Q16236 2/20 0.45
RECQL P46063 1/20 0.45
HKDC1 Q2TB90 1/20 0.45
HSP90AA1 P07900 1/20 0.44
CRHBP P24387 1/20 0.44
CRHR2 Q13324 1/20 0.44
KMT2A Q03164 6/20 0.43
MEN1 O00255 4/20 0.43
MAPT P10636 3/20 0.43
HTT P42858 2/20 0.43
ESR1 P03372 1/20 0.43
GAA P10253 1/20 0.43
ESR2 Q92731 1/20 0.43
USP2 O75604 1/20 0.42
POLB P06746 1/20 0.42
CYP2C9 P11712 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11787378 0.85 HTR6 (0.51) ALDH1A1KEAP1RAB9ALMNARECQL
SCHEMBL28165198 0.82 RECQL (0.46) ALDH1A1KEAP1RAB9ALMNARECQL
SCHEMBL28753722 0.78 KEAP1 (0.49) ALDH1A1KEAP1LMNARECQLKMT2A
SCHEMBL7573136 0.77 KEAP1 (0.76) ALDH1A1KEAP1LMNANFE2L2RECQL
SCHEMBL8913273 0.74 KEAP1 (0.51) ALDH1A1KEAP1RAB9ALMNARECQL
SCHEMBL7783915 0.74 CA12 (0.56) ALDH1A1KEAP1LMNANFE2L2KMT2A
SCHEMBL1073454 0.74 MEN1 (0.68) ALDH1A1KEAP1LMNANFE2L2HKDC1
SCHEMBL29123243 0.73 KEAP1 (0.44) ALDH1A1KEAP1RECQLKMT2AMEN1
SCHEMBL11684146 0.73 TUBB4A (0.43) ALDH1A1LMNAKMT2AMEN1MAPT
SCHEMBL25255094 0.73 HTR6 (0.46) ALDH1A1KEAP1RAB9ANFE2L2HKDC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6120972-A COPOLYMER OF ACRYLIC ESTER AND CARBONATE WITH PHOTOACID GENERATOR FOR PHOTOSENSITIVE ELEMENTS JSR CORPORATION (JP) 2000-09-19 US disclosed
EP-0901043-A1 Radiation-sensitive resin composition JSR Corporation (JP) 1999-03-10 EP disclosed