SCHEMBL815584

SCHEMBL815584

CN(C)C(=Cc1ccccc1)C(=O)c1ccccc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.50
MAPT P10636 3/20 0.50
KMT2A Q03164 3/20 0.50
LMNA P02545 2/20 0.50
GAA P10253 1/20 0.50
AKR1C1 Q04828 1/20 0.48
MEN1 O00255 2/20 0.48
RAB9A P51151 1/20 0.47
CES2 O00748 4/20 0.46
CES1 P23141 4/20 0.46
MTNR1A P48039 2/20 0.46
MTNR1B P49286 2/20 0.46
AKR1C3 P42330 1/20 0.46
EGFR P00533 2/20 0.43
KDM4E B2RXH2 1/20 0.42
POLB P06746 1/20 0.42
HPGD P15428 1/20 0.42
MAPK1 P28482 1/20 0.42
HTT P42858 1/20 0.42
RECQL P46063 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9099207 1.00 ALDH1A1 (0.50) ALDH1A1MAPTKMT2ALMNAGAA
SCHEMBL3912820 0.82 AKR1C3 (0.55) ALDH1A1KMT2ALMNAAKR1C1MEN1
SCHEMBL11139540 0.82 ALDH1A1 (0.50) ALDH1A1MAPTKMT2AAKR1C1MEN1
SCHEMBL3937738 0.81 AKR1C3 (0.53) ALDH1A1MAPTKMT2ALMNAGAA
SCHEMBL6265387 0.81 NPC1 (0.50) ALDH1A1MAPTKMT2ALMNAGAA
SCHEMBL7677075 0.79 MCL1 (0.49) ALDH1A1KMT2AAKR1C1MEN1MTNR1A
SCHEMBL23605859 0.79 KMT2A (0.59) ALDH1A1MAPTKMT2ALMNAGAA
SCHEMBL8024347 0.76 EGFR (0.46) ALDH1A1MAPTKMT2ALMNAGAA
SCHEMBL8113061 0.75 ALDH1A1 (0.46) ALDH1A1MAPTKMT2ALMNAGAA
SCHEMBL351852 0.75 AKR1C3 (0.67) ALDH1A1MAPTKMT2ALMNAGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 202 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117384378-A Photosensitive polyamic acid ester resin, resin composition, preparation method and application thereof 明士(北京)新材料开发有限公司 2024-01-12 CN claimed
CN-115160569-B Photosensitive polyamic acid ester resin, resin composition and electronic component 明士(北京)新材料开发有限公司 2022-12-27 CN claimed
CN-115160569-A Photosensitive polyamic acid ester resin, resin composition and electronic component 明士(北京)新材料开发有限公司 2022-10-11 CN claimed
CN-111522200-B Negative PSPI resin for 12-inch silicon wafer and preparation method and application thereof 中国科学院化学研究所 2021-07-27 CN claimed
CN-111522200-A Negative PSPI resin for 12-inch silicon wafer and preparation method and application thereof 中国科学院化学研究所 2020-08-11 CN claimed
CN-1326177-C Composition for forming an electron emission source and an electron emission source prepared therefrom SAMSUNG SDI CO LTD (KR) 2007-07-11 CN claimed
CN-1941218-A A conductive electrode powder, a method for preparing the same, preparing method of electrode of plasma display and plasma display SAMSUNG SDI CO LTD (KR) 2007-04-04 CN claimed
EP-0428398-A2 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1991-05-22 EP claimed
CN-118302485-A Resin composition 日产化学株式会社 2024-07-05 CN disclosed
CN-118244580-A Photosensitive resin composition, cured film using same, method for producing same, and semiconductor device 旭化成株式会社 2024-06-25 CN disclosed
CN-113825809-B Printing ink, method for producing printed matter using same, and printed matter 东丽株式会社 2024-05-31 CN disclosed
CN-115667404-B Curable resin composition, cured film, laminate, method for producing cured film, and semiconductor device 富士胶片株式会社 2024-05-03 CN disclosed
CN-117940516-A Resin composition, cured product, laminate, method for producing cured product, method for producing laminate, method for producing semiconductor device, and semiconductor device 富士胶片株式会社 2024-04-26 CN disclosed
CN-117881745-A Resin composition, cured product, laminate, method for producing cured product, method for producing laminate, method for producing semiconductor device, and compound 富士胶片株式会社 2024-04-12 CN disclosed
CN-1157747-C Plasma display and method for manufacturing the same 东丽株式会社 2004-07-14 CN disclosed
CN-1384521-A Manufacture of plasma display plate TOKYO APPLIED CHEMICAL CO LTD (JP) 2002-12-11 CN disclosed
CN-1325038-A Paste material display device and mfg. method for display device TORAY INDUSTRIES (JP) 2001-12-05 CN disclosed
CN-1237271-A Plasma display and method for manufacturing the same TORAY INDUSTRIES (JP) 1999-12-01 CN disclosed
EP-0245505-B2 TERMINAL-MODIFIED BLOCK COPOLYMER AND COMPOSITION CONTAINING SAID COPOLYMER ASAHI CHEMICAL IND (JP) 1996-08-14 EP disclosed
EP-0428398-A2 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1991-05-22 EP disclosed