Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 2/20 | 0.50 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.47 |
| ▸ | HPGD | P15428 | 2/20 | 0.47 |
| ▸ | MTNR1A | P48039 | 2/20 | 0.46 |
| ▸ | MTNR1B | P49286 | 2/20 | 0.46 |
| ▸ | CES2 | O00748 | 3/20 | 0.46 |
| ▸ | CES1 | P23141 | 3/20 | 0.46 |
| ▸ | AKR1C1 | Q04828 | 1/20 | 0.44 |
| ▸ | MAPT | P10636 | 4/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.44 |
| ▸ | EGFR | P00533 | 2/20 | 0.44 |
| ▸ | MEN1 | O00255 | 1/20 | 0.44 |
| ▸ | LMNA | P02545 | 3/20 | 0.43 |
| ▸ | GAA | P10253 | 1/20 | 0.43 |
| ▸ | RAB9A | P51151 | 1/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.42 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.42 |
| ▸ | HTT | P42858 | 2/20 | 0.41 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4729447 | 0.84 | NPC1 (0.54) | NPC1L3MBTL1ALDH1A1HPGDMTNR1A | |
| SCHEMBL11142380 | 0.84 | NPC1 (0.54) | NPC1L3MBTL1ALDH1A1HPGDMTNR1A | |
| SCHEMBL3951056 | 0.83 | NPC1 (0.53) | NPC1L3MBTL1ALDH1A1HPGDMTNR1A | |
| SCHEMBL815584 | 0.81 | ALDH1A1 (0.50) | ALDH1A1HPGDMTNR1AMTNR1BCES2 | |
| SCHEMBL9099207 | 0.81 | ALDH1A1 (0.50) | ALDH1A1HPGDMTNR1AMTNR1BCES2 | |
| SCHEMBL8113061 | 0.81 | ALDH1A1 (0.46) | ALDH1A1HPGDMTNR1AMTNR1BCES2 | |
| SCHEMBL9393440 | 0.79 | MEN1 (0.44) | NPC1L3MBTL1ALDH1A1HPGDMTNR1A | |
| SCHEMBL15539286 | 0.78 | MTNR1A (0.48) | NPC1L3MBTL1ALDH1A1HPGDMTNR1A | |
| SCHEMBL11206642 | 0.77 | NPC1 (0.49) | NPC1L3MBTL1ALDH1A1HPGDMTNR1A | |
| SCHEMBL12411252 | 0.77 | NPC1 (0.49) | NPC1L3MBTL1ALDH1A1HPGDMTNR1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 176 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117384378-A | Photosensitive polyamic acid ester resin, resin composition, preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2024-01-12 | — | — | CN | claimed |
| CN-115160569-B | Photosensitive polyamic acid ester resin, resin composition and electronic component | 明士(北京)新材料开发有限公司 | 2022-12-27 | — | — | CN | claimed |
| CN-115160569-A | Photosensitive polyamic acid ester resin, resin composition and electronic component | 明士(北京)新材料开发有限公司 | 2022-10-11 | — | — | CN | claimed |
| CN-111522200-B | Negative PSPI resin for 12-inch silicon wafer and preparation method and application thereof | 中国科学院化学研究所 | 2021-07-27 | — | — | CN | claimed |
| CN-111522200-A | Negative PSPI resin for 12-inch silicon wafer and preparation method and application thereof | 中国科学院化学研究所 | 2020-08-11 | — | — | CN | claimed |
| CN-1326177-C | Composition for forming an electron emission source and an electron emission source prepared therefrom | SAMSUNG SDI CO LTD (KR) | 2007-07-11 | — | — | CN | claimed |
| CN-1941218-A | A conductive electrode powder, a method for preparing the same, preparing method of electrode of plasma display and plasma display | SAMSUNG SDI CO LTD (KR) | 2007-04-04 | — | — | CN | claimed |
| CN-118302485-A | Resin composition | 日产化学株式会社 | 2024-07-05 | — | — | CN | disclosed |
| CN-118244580-A | Photosensitive resin composition, cured film using same, method for producing same, and semiconductor device | 旭化成株式会社 | 2024-06-25 | — | — | CN | disclosed |
| CN-113825809-B | Printing ink, method for producing printed matter using same, and printed matter | 东丽株式会社 | 2024-05-31 | — | — | CN | disclosed |
| CN-115667404-B | Curable resin composition, cured film, laminate, method for producing cured film, and semiconductor device | 富士胶片株式会社 | 2024-05-03 | — | — | CN | disclosed |
| CN-117940516-A | Resin composition, cured product, laminate, method for producing cured product, method for producing laminate, method for producing semiconductor device, and semiconductor device | 富士胶片株式会社 | 2024-04-26 | — | — | CN | disclosed |
| CN-117881745-A | Resin composition, cured product, laminate, method for producing cured product, method for producing laminate, method for producing semiconductor device, and compound | 富士胶片株式会社 | 2024-04-12 | — | — | CN | disclosed |
| CN-1941218-A | A conductive electrode powder, a method for preparing the same, preparing method of electrode of plasma display and plasma display | SAMSUNG SDI CO LTD (KR) | 2007-04-04 | — | — | CN | disclosed |
| CN-1928718-A | Photoresist composition for forming light-proof pattern of plasma display device | TOKYO OHKA KOGYO CO LTD (JP) | 2007-03-14 | — | — | CN | disclosed |
| WO-2005091071-A1 | PHOTOSENSITIVE INSULATIVE PASTE COMPOSITION AND PHOTOSENSITIVE FILM USING THE SAME | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-09-29 | — | — | WO | disclosed |
| CN-1668980-A | Highly heat-resistant, negative-type photosensitive resin composition | ASAHI CHEMICAL CORP (JP) | 2005-09-14 | — | — | CN | disclosed |
| CN-1212545-C | Photosensitive insulated glue composition and photosensitive film of the glue | TOKYO APPLIED CHEMICAL CO LTD (JP) | 2005-07-27 | — | — | CN | disclosed |
| CN-1204586-C | Manufacture of plasma display plate | TOKYO APPLIED CHEMICAL CO LTD (JP) | 2005-06-01 | — | — | CN | disclosed |
| CN-1384521-A | Manufacture of plasma display plate | TOKYO APPLIED CHEMICAL CO LTD (JP) | 2002-12-11 | — | — | CN | disclosed |