Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 7/20 | 0.58 |
| ▸ | NPC1 | O15118 | 7/20 | 0.58 |
| ▸ | RAB9A | P51151 | 7/20 | 0.58 |
| ▸ | LMNA | P02545 | 3/20 | 0.58 |
| ▸ | BCHE | P06276 | 2/20 | 0.58 |
| ▸ | RECQL | P46063 | 2/20 | 0.54 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.54 |
| ▸ | CYP1B1 | Q16678 | 2/20 | 0.54 |
| ▸ | CASP3 | P42574 | 2/20 | 0.54 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.54 |
| ▸ | SENP8 | Q96LD8 | 2/20 | 0.54 |
| ▸ | SENP7 | Q9BQF6 | 2/20 | 0.54 |
| ▸ | SENP6 | Q9GZR1 | 2/20 | 0.54 |
| ▸ | MAOB | P27338 | 2/20 | 0.53 |
| ▸ | PLIN1 | O60240 | 1/20 | 0.53 |
| ▸ | TNFRSF1A | P19438 | 1/20 | 0.53 |
| ▸ | ACHE | P22303 | 1/20 | 0.53 |
| ▸ | PLIN5 | Q00G26 | 1/20 | 0.53 |
| ▸ | ABHD5 | Q8WTS1 | 1/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.52 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL815583 | 1.00 | MAPT (0.58) | MAPTNPC1RAB9ALMNABCHE | |
| SCHEMBL31580406 | 0.89 | RAB9A (0.66) | MAPTNPC1RAB9ALMNASMN1; SMN2 | |
| SCHEMBL27972949 | 0.88 | MAPT (0.52) | MAPTNPC1RAB9ALMNABCHE | |
| SCHEMBL6561859 | 0.84 | CA1 (0.56) | MAPTLMNASMN1; SMN2ALDH1A1NFKB1 | |
| SCHEMBL7455794 | 0.84 | CA1 (0.56) | MAPTLMNASMN1; SMN2ALDH1A1NFKB1 | |
| SCHEMBL6265390 | 0.84 | MAPT (0.55) | MAPTNPC1RAB9ALMNABCHE | |
| SCHEMBL9341539 | 0.82 | MAPT (0.44) | MAPTNPC1RAB9ALMNABCHE | |
| SCHEMBL9341533 | 0.82 | MAPT (0.44) | MAPTNPC1RAB9ALMNABCHE | |
| SCHEMBL9006476 | 0.82 | MAPT (0.69) | MAPTNPC1RAB9ALMNABCHE | |
| SCHEMBL8534634 | 0.81 | MAPT (0.59) | MAPTNPC1RAB9ALMNASMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 201 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117384378-A | Photosensitive polyamic acid ester resin, resin composition, preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2024-01-12 | — | — | CN | claimed |
| CN-114560993-B | Preparation method of chalcone-terminated photosensitive waterborne polyurethane/epoxy acrylate | 阜阳师范大学 | 2023-08-15 | — | — | CN | claimed |
| CN-115160569-B | Photosensitive polyamic acid ester resin, resin composition and electronic component | 明士(北京)新材料开发有限公司 | 2022-12-27 | — | — | CN | claimed |
| CN-115160569-A | Photosensitive polyamic acid ester resin, resin composition and electronic component | 明士(北京)新材料开发有限公司 | 2022-10-11 | — | — | CN | claimed |
| CN-114560993-A | Preparation method of chalcone-terminated photosensitive waterborne polyurethane/epoxy acrylate | 阜阳师范大学 | 2022-05-31 | — | — | CN | claimed |
| CN-111522200-B | Negative PSPI resin for 12-inch silicon wafer and preparation method and application thereof | 中国科学院化学研究所 | 2021-07-27 | — | — | CN | claimed |
| CN-111522200-A | Negative PSPI resin for 12-inch silicon wafer and preparation method and application thereof | 中国科学院化学研究所 | 2020-08-11 | — | — | CN | claimed |
| CN-103712976-A | Selective recognition of Fe3+Method for detecting capability | UNIV SOOCHOW | 2014-04-09 | — | — | CN | claimed |
| CN-1326177-C | Composition for forming an electron emission source and an electron emission source prepared therefrom | SAMSUNG SDI CO LTD (KR) | 2007-07-11 | — | — | CN | claimed |
| CN-1941218-A | A conductive electrode powder, a method for preparing the same, preparing method of electrode of plasma display and plasma display | SAMSUNG SDI CO LTD (KR) | 2007-04-04 | — | — | CN | claimed |
| EP-0428398-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1991-05-22 | — | — | EP | claimed |
| CN-120797116-A | High-performance aluminum alloy profile and preparation method thereof | 泰兴市盛泰铝业制造有限公司 | 2025-10-17 | — | — | CN | disclosed |
| CN-118302485-A | Resin composition | 日产化学株式会社 | 2024-07-05 | — | — | CN | disclosed |
| CN-118244580-A | Photosensitive resin composition, cured film using same, method for producing same, and semiconductor device | 旭化成株式会社 | 2024-06-25 | — | — | CN | disclosed |
| CN-113825809-B | Printing ink, method for producing printed matter using same, and printed matter | 东丽株式会社 | 2024-05-31 | — | — | CN | disclosed |
| CN-1157747-C | Plasma display and method for manufacturing the same | 东丽株式会社 | 2004-07-14 | — | — | CN | disclosed |
| CN-1384521-A | Manufacture of plasma display plate | TOKYO APPLIED CHEMICAL CO LTD (JP) | 2002-12-11 | — | — | CN | disclosed |
| CN-1325038-A | Paste material display device and mfg. method for display device | TORAY INDUSTRIES (JP) | 2001-12-05 | — | — | CN | disclosed |
| CN-1237271-A | Plasma display and method for manufacturing the same | TORAY INDUSTRIES (JP) | 1999-12-01 | — | — | CN | disclosed |
| EP-0428398-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1991-05-22 | — | — | EP | disclosed |