Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 3/20 | 0.35 |
| ▸ | RAB9A | P51151 | 3/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.35 |
| ▸ | CASP3 | P42574 | 1/20 | 0.35 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.35 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.35 |
| ▸ | SENP6 | Q9GZR1 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 2/20 | 0.35 |
| ▸ | ACHE | P22303 | 1/20 | 0.35 |
| ▸ | CYP1A2 | P05177 | 4/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.33 |
| ▸ | CYP2D6 | P10635 | 3/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 3/20 | 0.33 |
| ▸ | CLK4 | Q9HAZ1 | 2/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.32 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11137923 | 0.78 | CYP1A2 (0.39) | NPC1RAB9ASMN1; SMN2TSHRACHE | |
| SCHEMBL818832 | 0.78 | CSNK2A2 (0.36) | NPC1RAB9ASMN1; SMN2TSHRALDH1A1 | |
| SCHEMBL820365 | 0.78 | CA1 (0.35) | TSHRCYP1A2CYP3A4LMNAHPGD | |
| SCHEMBL820401 | 0.78 | CYP1A2 (0.40) | NPC1RAB9ASMN1; SMN2CYP1A2CYP3A4 | |
| SCHEMBL820110 | 0.78 | ACHE (0.33) | TSHRACHECYP1A2ALDH1A1CYP2A6 | |
| SCHEMBL712397 | 0.77 | ACHE (0.39) | NPC1RAB9ASMN1; SMN2CASP3SENP8 | |
| SCHEMBL27709932 | 0.77 | DPP4 (0.43) | — | |
| SCHEMBL819738 | 0.75 | CA12 (0.38) | — | |
| SCHEMBL195576 | 0.75 | LMNA (0.36) | NPC1RAB9ASMN1; SMN2TSHRACHE | |
| SCHEMBL336967 | 0.75 | TSHR (0.38) | NPC1RAB9ASMN1; SMN2CASP3SENP8 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8247510-B2 | Copolymer and production process thereof | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-08-21 | — | — | US | disclosed |
| US-8188202-B2 | Making polymers based on monomer 9,9-Diallylfluorene; diallyl groups form cyclohexane ring upon polymerization; superior heat resistance; use of diimine-based nickel complex catalyst, organoaluminum, and boron compound | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-05-29 | — | — | US | disclosed |
| US-20110288250-A1 | Copolymer and Production Process Thereof | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-11-24 | — | — | US | disclosed |
| US-8044159-B2 | Homopolymer and copolymer, and production process thereof | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-10-25 | — | — | US | disclosed |
| US-7964691-B2 | 5,5-diallyl-2,2-dimethyl-1,3-dioxane as monomer units; polymerization catalysts; heat resistance | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-06-21 | — | — | US | disclosed |
| US-7956145-B2 | Polymerization of 1,6-heptadiene in the presence of a catalyst formed by contacting a transition metal with a diimino aluminum or boron compound, giving a polymer structure of alternating ethylene and cyclopentene; superior balance between a heat resistance and workability | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-06-07 | — | — | US | disclosed |
| US-7943715-B2 | Polymerization of 1,6-heptadiene in the presence of a catalyst formed by contacting a transition metal with a diimino aluminum or boron compound, giving a polymer structure of alternating ethylene and cyclopentene; superior balance between a heat resistance and workability | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-05-17 | — | — | US | disclosed |
| US-7799886-B2 | Diene polymer and production process thereof | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-09-21 | — | — | US | disclosed |
| US-20100234546-A1 | DIENE POLYMER AND PRODUCTION PROCESS THEREOF | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-09-16 | — | — | US | disclosed |
| US-20090221774-A1 | DIENE POLYMER AND PRODUCTION PROCESS THEREOF | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-09-03 | — | — | US | disclosed |
| WO-2009038031-A1 | BLOCK COPOLYMER AND PRODUCTION PROCESS THEREOF | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-03-26 | — | — | WO | disclosed |
| WO-2009038006-A1 | RANDOM COPOLYMER AND PRODUCTION PROCESS THEREOF | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-03-26 | — | — | WO | disclosed |
| US-20080234450-A1 | DIENE POLYMER AND PROCESS FOR PRODUCING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-09-25 | — | — | US | disclosed |
| US-20080221287-A1 | DIENE POLYMER AND PROCESS FOR PRODUCING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-09-11 | — | — | US | disclosed |
| US-20080221288-A1 | DIENE POLYMER AND PROCESS FOR PRODUCING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-09-11 | — | — | US | disclosed |
| US-20080221286-A1 | DIENE POLYMER AND PROCESS FOR PRODUCING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-09-11 | — | — | US | disclosed |
| US-20080214755-A1 | OLEFIN-DIENE COPOLYMER AND PROCESS FOR PRODUCING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-09-04 | — | — | US | disclosed |
| US-20080214754-A1 | DIENE POLYMER AND PROCESS FOR PRODUCING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-09-04 | — | — | US | disclosed |
| US-20080214756-A1 | CYCLIC OLEFIN-DIENE COPOLYMER AND PROCESS FOR PRODUCING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-09-04 | — | — | US | disclosed |
| WO-2007023618-A1 | HOMOPOLYMER AND COPOLYMER, AND PRODUCTION PROCESS THEREOF | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-03-01 | — | — | WO | disclosed |