SCHEMBL82366

SCHEMBL82366

Cc1cc(C)c(C(=O)[PH](=O)c2ccccc2)c(C)c1

nearest known ligand 0.40

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
LMNA P02545 4/20 0.40
KDM4E B2RXH2 2/20 0.38
L3MBTL1 Q9Y468 2/20 0.38
KMT2A Q03164 3/20 0.38
MEN1 O00255 2/20 0.36
METAP2 P50579 1/20 0.36
FFAR4 Q5NUL3 1/20 0.35
HPGD P15428 2/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
NPSR1 Q6W5P4 1/20 0.35
MCOLN3 Q8TDD5 1/20 0.35
GAA P10253 1/20 0.35
NFE2L2 Q16236 1/20 0.34
ALDH1A1 P00352 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28100158 0.98 LMNA (0.39) LMNAKDM4EL3MBTL1KMT2AMEN1
SCHEMBL29365769 0.98 LMNA (0.39) LMNAKDM4EL3MBTL1KMT2AMEN1
SCHEMBL28781832 0.98 LMNA (0.39) LMNAKDM4EL3MBTL1KMT2AMEN1
SCHEMBL1024553 0.98 LMNA (0.39) LMNAKDM4EL3MBTL1KMT2AMEN1
Ammonia Solution, Strong SCHEMBL2909570 0.98 LMNA (0.39) LMNAKDM4EL3MBTL1KMT2AMEN1
Potassium SCHEMBL29629366 0.98 LMNA (0.39) LMNAKDM4EL3MBTL1KMT2AMEN1
SCHEMBL1024427 0.98 LMNA (0.39) LMNAKDM4EL3MBTL1KMT2AMEN1
Lithium SCHEMBL29779115 0.98 LMNA (0.39) LMNAKDM4EL3MBTL1KMT2AMEN1
SCHEMBL21831853 0.98 LMNA (0.39) LMNAKDM4EL3MBTL1KMT2AMEN1
Benzophenone SCHEMBL28167644 0.92 ALDH1A1 (0.42) LMNAL3MBTL1KMT2AMEN1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 4418 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120059068-A Antibacterial composite resin and preparation method and application thereof 浙江同济科技职业学院 2025-05-30 CN claimed
CN-119463582-A Shape memory self-repairing 3D printing ink and preparation method thereof 厦门市维众软件科技有限公司 2025-02-18 CN claimed
CN-119308491-A Panel, composition for forming a coating and method of manufacturing a panel 财纳福诺木业(中国)有限公司 2025-01-14 CN claimed
CN-118755050-A Photo-curing resin and preparation method thereof, photo-curing adhesive and preparation method thereof 歌尔光学科技(青岛)有限公司 2024-10-11 CN claimed
CN-118678974-A Curable formulations containing collagen 科弗朗有限公司 2024-09-20 CN claimed
CN-118652624-A Self-cleaning wear-resistant UV (ultraviolet) photo-curing coating as well as preparation method and application thereof 浙江大学 2024-09-17 CN claimed
EP-4422707-A1 COLLAGEN-CONTAINING CURABLE FORMULATIONS CollPlant Ltd. (IL) 2024-09-04 EP claimed
CN-110746861-B Anti-scalding oil, preparation method thereof and ink-jet gold stamping system applying anti-scalding oil 广州宁为科技有限公司 2024-07-16 CN claimed
CN-118290660-A Photo-curing 3D printing material and preparation method thereof 万华化学集团股份有限公司 2024-07-05 CN claimed
CN-116157474-B Photo-curable ink composition for inkjet printing 阪田油墨股份有限公司 2024-06-07 CN claimed
US-20110201717-A1 ACTINICALLY CURABLE ADHESIVE COMPOSITION E. I. DU PONT DE NEMOURS AND COMPANY (US) 2011-08-18 US claimed
WO-2011049607-A1 RADIATION CURABLE COATING FOR OPTICAL FIBER DSM IP ASSETS B.V. (NL) 2011-04-28 WO claimed
US-7927781-B2 Photosensitive resin composition, method for preparing the same, and dry film resist comprising the same DONGJIN SEMICHEM CO., LTD. (KR) 2011-04-19 US claimed
CN-101970590-A Actinically curable adhesive composition DU PONT 2011-02-09 CN claimed
CN-100535746-C Photoresist resin composition DONGJIN SAEMIGUNG CO LTD (KR) 2009-09-02 CN claimed
WO-2009086491-A1 ACTINICALLY CURABLE ADHESIVE COMPOSITION E. I. DU PONT DE NEMOURS AND COMPANY (US) 2009-07-09 WO claimed
US-20090136872-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PREPARING THE SAME, AND DRY FILM RESIST COMPRISING THE SAME DONGJIN SEMICHEM CO., LTD. (KR) 2009-05-28 US claimed
CN-1693991-A Photoresist resin composition DONGJIN SAEMIGUNG CO LTD (KR) 2005-11-09 CN claimed
US-6756420-B2 HIGH-SOLIDS COATING COMPOSITION WHICH COMPRISES (A) A COMPOUND WHICH HAS AT LEAST ONE RADICALLY POLYMERIZABLE UNSATURATED GROUP PER MOLECULE, (B) A HYDROXYL GROUP-CONTAINING ESTER COMPOUND WHICH IS OBTAINED BY ESTER-FORMING ADDITION REACTION KANSAI PAINT CO., LTD. (JP) 2004-06-29 US claimed
US-20030119980-A1 Coating composition and a process to form a coating film with use thereof KANSAI PAINT CO., LTD. (JP) 2003-06-26 US claimed