Known targets — ChEMBL curated mechanism
ABL1ACEACHEACVR1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALKAVPR1AAVPR2BCHEBCRCA2CACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCASRCCR5CDK4CDK6CFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNA3CHRNA7CHRNB1CHRNB4CHRNDCHRNECHRNGCOXFA4COXFA4L2CRBNCSF1RCUL4ACYP19A1DDB1DPP4DRD1DRD2DRD3DRD4EDNRAEGFREML4ERBB2ERBB4ESR1ESR2FGFR1FGFR3FLT1FLT3FLT4GAAGABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGHSRGLAGNRHRGPD2GRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BGSTP1HCN4HCRTR1HCRTR2HDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HRH2HRH3HSD11B1HSP90AA1HSP90AB1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IMPDH1IMPDH2ITGA2BITGB3ITKJAK1JAK2KCNA1KCNA10KCNA2KCNA3KCNA4KCNA5KCNA6KCNA7KCNB1KCNB2KCNC1KCNC2KCNC3KCNC4KCND1KCND2KCND3KCNF1KCNG1KCNG2KCNG3KCNG4KCNH1KCNH2KCNH3KCNH4KCNH5KCNH6KCNH7KCNH8KCNJ2KCNJ3KCNJ5KCNK3KCNK9KCNQ1KCNQ2KCNQ3KCNQ4KCNQ5KCNS1KCNS2KCNS3KCNV1KCNV2KDRKITKLKB1LCKMMAOAMAOBMAPK14METMMP1MMP13MMP7MMP8MT-ND1MT-ND2MT-ND3MT-ND4MT-ND4LMT-ND5MT-ND6NDUFA1NDUFA10NDUFA11NDUFA12NDUFA13NDUFA2NDUFA3NDUFA5NDUFA6NDUFA7NDUFA8NDUFA9NDUFAB1NDUFAF1NDUFAF2NDUFAF3NDUFAF4NDUFB1NDUFB10NDUFB11NDUFB2NDUFB3NDUFB4NDUFB5NDUFB6NDUFB7NDUFB8NDUFB9NDUFC1NDUFC2NDUFS1NDUFS2NDUFS3NDUFS4NDUFS5NDUFS6NDUFS7NDUFS8NDUFV1NDUFV2NDUFV3NR3C1NS5ANTRK1NTRK2NTRK3ODC1OPRD1OPRK1OPRM1P2RY12PAHPARP1PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDE5APDE7APDE7BPDE8APDE8BPDGFRAPDGFRBPIK3CAPIK3CDPNPPOLA1POLA2POLD1POLD2POLD3POLD4POLEPOLE2POLE3PPARGPRIM1PRIM2PRKCAPRKCBPRKCDPRKCEPRKCGPRKCHPRKCIPRKCQPRKCZPRKD1PRKD3PTGS1PTGS2RBX1RENRETROCK1ROCK2RPE65RRM1RRM2RRM2BS1PR1S1PR2S1PR3S1PR4S1PR5SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC18A2SLC6A1SLC6A2SLC6A3SLC6A4SLC9A3SRCTACR1TOP1TOP2ATOP2BTTRTYMPdacAdacBdacCembAfolAftsIgyrAgyrBmrcAmrcBmrdAparCparEpolrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TTR known ✓ | P02766 | 1/20 | 0.33 |
| ▸ | PGAM1 | P18669 | 1/20 | 0.32 |
| ▸ | PTPRC | P08575 | 1/20 | 0.31 |
| ▸ | STAT3 | P40763 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8608275 | 0.98 | TTR (0.33) | TTRPGAM1PTPRCSTAT3 | |
| SCHEMBL823887 | 0.98 | TTR (0.33) | TTRPGAM1PTPRCSTAT3 | |
| SCHEMBL7103290 | 0.97 | TTR (0.33) | TTRPGAM1PTPRCSTAT3 | |
| Hydrochloric Acid SCHEMBL8976635 | 0.87 | TTR (0.32) | TTR | |
| SCHEMBL10769121 | 0.86 | ALPL (0.35) | PGAM1 | |
| SCHEMBL7645795 | 0.84 | — | — | |
| SCHEMBL823909 | 0.83 | — | — | |
| SCHEMBL818753 | 0.83 | BRD9 (0.31) | PTPRC | |
| SCHEMBL9644548 | 0.83 | STAT3 (0.41) | STAT3 | |
| SCHEMBL7103287 | 0.82 | PKLR (0.36) | PGAM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 55 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5075194-A | Positive photoresist composition containing 4,4-diester, 4,5-diester, or 5,5-diester of spiroglycol and 1-oxo-2-diazonaphthalene-5-sulfonic acid chloride | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 1991-12-24 | — | — | US | claimed |
| WO-2022080195-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | 日本ゼオン株式会社 | 2022-04-21 | — | — | WO | disclosed |
| EP-1053509-A4 | PHOTOSENSITIVE DIAZONAPHTHOQUINONE ESTERS BASED ON SELECTED CYCLIC ALKYL ETHER-CONTAINING PHENOLICS AND THEIR USE IN RADIATION SENSITIVE MIXTURES | ARCH SPEC CHEM INC (US) | 2001-10-17 | — | — | EP | disclosed |
| EP-1053509-A1 | PHOTOSENSITIVE DIAZONAPHTHOQUINONE ESTERS BASED ON SELECTED CYCLIC ALKYL ETHER-CONTAINING PHENOLICS AND THEIR USE IN RADIATION SENSITIVE MIXTURES | Arch Specialty Chemicals, Inc. (US) | 2000-11-22 | — | — | EP | disclosed |
| US-6140026-A | POSITIVE PATTERN IMAGES ON SUBSTRATES, COATING A BINDER RESIN WITH PHOTOSENSITIVE COMPOUND OF O-QUINONEDIAZIDESULFONIC ACID OF PHENOL | ARCH SPECIALTY CHEMICALS, INC. (US) | 2000-10-31 | — | — | US | disclosed |
| US-6051358-A | UNSYMETRICAL PHOTOACTIVE COMPOUND HAVING AT LEAST 2 DIAZOOXYNAPHTHALENESULFONYLOXY GROUPS | SHIPLEY COMPANY, L.L.C. (US) | 2000-04-18 | — | — | US | disclosed |
| EP-0725053-B1 | Selected O-quinonediazide sulfonic acid esters of phenolic compounds and their use in radiation-sensitive compositions | OLIN MICROELECTRONIC CHEM INC (US) | 2000-04-05 | — | — | EP | disclosed |
| EP-0840170-B1 | Selected O-quinonediazide sulfonic acid esters of phenolic compounds | OLIN MICROELECTRONIC CHEM INC (US) | 2000-04-05 | — | — | EP | disclosed |
| US-6040107-A | POSITIVE PHOTORESISTS | OLIN MICROELECTRONIC CHEMICALS, INC. (US) | 2000-03-21 | — | — | US | disclosed |
| WO-1999040485-A1 | PHOTOSENSITIVE DIAZONAPHTHOQUINONE ESTERS BASED ON SELECTED CYCLIC ALKYL ETHER-CONTAINING PHENOLICS AND THEIR USE IN RADIATION SENSITIVE MIXTURES | OLIN MICROELECTRONIC CHEMICALS, INC. (US) | 1999-08-12 | — | — | WO | disclosed |
| US-4992356-A | Positive photoresists | OLIN HUNT SPECIALTY PRODUCTS INC. (US) | 1991-02-12 | — | — | US | disclosed |
| WO-1990013058-A1 | HEXAHYDROXYBENZOPHENONE COMPOUNDS AS SENSITIVITY ENHANCERS FOR RADIATION SENSITIVE MIXTURES | OLIN HUNT SPECIALTY PRODUCTS INC. (US) | 1990-11-01 | — | — | WO | disclosed |
| US-4957588-A | Method for high temperature reaction process | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1990-09-18 | — | — | US | disclosed |
| US-4957846-A | PHOTORESISTS, PHOTOLITHOGRAPHY, PRINTED CIRCUITS | OLIN HUNT SPECIALTY PRODUCTS INC. (US) | 1990-09-18 | — | — | US | disclosed |
| WO-1990007538-A1 | SELECTED TRINUCLEAR NOVOLAK OLIGOMERS AND THEIR USE IN PHOTOACTIVE COMPOUNDS AND RADIATION SENSITIVE MIXTURES | OLIN HUNT SPECIALTY PRODUCTS INC. (US) | 1990-07-12 | — | — | WO | disclosed |
| EP-0370486-A2 | Method for high temperature reaction process | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1990-05-30 | — | — | EP | disclosed |
| US-4886565-A | NEGATIVE ELECTRODE, COOLER; HIGH SPEED, NONDEFORMING; SEMICONDUCTORS | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1989-12-12 | — | — | US | disclosed |
| EP-0328078-A2 | Reactive ion etching apparatus | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1989-08-16 | — | — | EP | disclosed |
| US-4737437-A | Light sensitive diazo compound, composition and method of making the composition | EAST SHORE CHEMICAL CO. (US) | 1988-04-12 | — | — | US | disclosed |
| WO-1987006023-A1 | 4-BENZYL-PYROGALLOL, DIAZO-NAPHTHOQUINONE SULFONYL ESTER, PHOTORESIST, METHODS OF MAKING AFOREMENTIONED COMPOUNDS AND COMPOSITIONS | EAST SHORE CHEMICAL COMPANY (US) | 1987-10-08 | — | — | WO | disclosed |