Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTT | P42858 | 2/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 4/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL827929 | 0.88 | THRB (0.32) | THRBTSHR | |
| SCHEMBL824318 | 0.84 | GAA (0.42) | THRBTSHRALDH1A1HSD17B10 | |
| SCHEMBL13559162 | 0.79 | HTT (0.33) | HTTTHRBTSHRALDH1A1 | |
| SCHEMBL824343 | 0.77 | HTT (0.34) | HTT | |
| SCHEMBL278099 | 0.76 | ALDH1A1 (0.44) | THRBTSHRALDH1A1 | |
| SCHEMBL824288 | 0.76 | HTT (0.37) | HTT | |
| SCHEMBL36595 | 0.74 | TSHR (0.48) | HTTTHRBTSHRMEN1ALDH1A1 | |
| SCHEMBL28031899 | 0.74 | TSHR (0.48) | HTTTHRBTSHRMEN1ALDH1A1 | |
| SCHEMBL800122 | 0.74 | TSHR (0.41) | HTTTHRBTSHRALDH1A1 | |
| SCHEMBL13262538 | 0.74 | HTT (0.32) | HTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8518629-B2 | Resist composition for immersion exposure and method of forming resist pattern using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-08-27 | — | — | US | disclosed |
| US-8518629-B2 | Resist composition for immersion exposure and method of forming resist pattern using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-08-27 | — | — | US | disclosed |
| US-8518629-B2 | Resist composition for immersion exposure and method of forming resist pattern using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-08-27 | — | — | US | disclosed |
| US-8349534-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-01-08 | — | — | US | disclosed |
| US-8349534-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-01-08 | — | — | US | disclosed |
| US-8349534-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-01-08 | — | — | US | disclosed |
| US-8324331-B2 | Fluorine-containing compound and polymeric compound | DAITO CHEMIX CORPORATION (JP) | 2012-12-04 | — | — | US | disclosed |
| US-8324331-B2 | Fluorine-containing compound and polymeric compound | DAITO CHEMIX CORPORATION (JP) | 2012-12-04 | — | — | US | disclosed |
| US-8142979-B2 | Resist composition for immersion exposure and method of forming resist pattern using the same | Tokyo Ohka Tokyo Co., Ltd. (JP) | 2012-03-27 | — | — | US | disclosed |
| US-8142979-B2 | Resist composition for immersion exposure and method of forming resist pattern using the same | Tokyo Ohka Tokyo Co., Ltd. (JP) | 2012-03-27 | — | — | US | disclosed |
| US-8142979-B2 | Resist composition for immersion exposure and method of forming resist pattern using the same | Tokyo Ohka Tokyo Co., Ltd. (JP) | 2012-03-27 | — | — | US | disclosed |
| US-20100233623-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-09-16 | — | — | US | disclosed |
| US-20100233623-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-09-16 | — | — | US | disclosed |
| US-20100233623-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-09-16 | — | — | US | disclosed |
| US-20100168358-A1 | FLUORINE-CONTAINING COMPOUND AND POLYMERIC COMPOUND | DAITO CHEMIX CORPORATION (JP) | 2010-07-01 | — | — | US | disclosed |
| US-20100168358-A1 | FLUORINE-CONTAINING COMPOUND AND POLYMERIC COMPOUND | DAITO CHEMIX CORPORATION (JP) | 2010-07-01 | — | — | US | disclosed |
| US-20090311627-A1 | Resist composition for immersion exposure and method of forming resist pattern using the same | TOKYO OHKA KOGYO CO., LTD. | 2009-12-17 | — | — | US | disclosed |
| US-20090311627-A1 | Resist composition for immersion exposure and method of forming resist pattern using the same | TOKYO OHKA KOGYO CO., LTD. | 2009-12-17 | — | — | US | disclosed |
| US-20090311627-A1 | Resist composition for immersion exposure and method of forming resist pattern using the same | TOKYO OHKA KOGYO CO., LTD. | 2009-12-17 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100168358-A1 | FLUORINE-CONTAINING COMPOUND AND POLYMERIC COMPOUND | AFF1, AFF2, FLI1 | HTT 2707/4885THRB 3514/4885TSHR 1756/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.