SCHEMBL825368

SCHEMBL825368

CCC(C)(C)C(=O)Oc1ccccc1NC(=O)c1ccccc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ RAB9A P51151 4/20 0.49
▸ NPC1 O15118 3/20 0.49
▸ AHR P35869 2/20 0.49
▸ KMT2A Q03164 2/20 0.49
▸ NR1I2 O75469 1/20 0.49
▸ LMNA P02545 1/20 0.49
▸ TP53 P04637 1/20 0.49
▸ TAAR1 Q96RJ0 1/20 0.49
▸ GAA P10253 2/20 0.48
▸ POLB P06746 1/20 0.48
▸ HPGD P15428 1/20 0.48
▸ MLYCD O95822 1/20 0.47
▸ MAPT P10636 1/20 0.47
▸ MAPK1 P28482 1/20 0.47
▸ SMN1; SMN2 Q16637 1/20 0.47
▸ PRSS1 P07477 1/20 0.46
▸ CTSG P08311 1/20 0.46
▸ CTRB1 P17538 1/20 0.46
▸ CMA1 P23946 1/20 0.46
▸ ELANE P08246 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL825408 0.79 MAPT (0.51) KMT2ALMNAGAAMAPTSMN1; SMN2
SCHEMBL825407 0.78 KMT2A (0.49) RAB9ANPC1AHRKMT2ANR1I2
SCHEMBL825380 0.78 NPC1 (0.58) RAB9ANPC1KMT2AGAAMAPT
SCHEMBL11575920 0.78 KMT2A (0.64) RAB9ANPC1AHRKMT2ANR1I2
SCHEMBL825514 0.78 NPC1 (0.61) RAB9ANPC1KMT2ATP53GAA
SCHEMBL8970981 0.77 PTK2 (0.70) RAB9ANPC1AHRKMT2ATP53
SCHEMBL6959171 0.76 NPC1 (0.59) RAB9ANPC1AHRKMT2ANR1I2
SCHEMBL16685068 0.76 KMT2A (0.77) RAB9ANPC1AHRKMT2ANR1I2
SCHEMBL825357 0.76 ELANE (0.73) RAB9AHPGDMAPTMAPK1ELANE
SCHEMBL825370 0.76 KMT2A (0.52) RAB9ANPC1AHRKMT2ANR1I2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8142977-B2 mixture of resin which decomposes under acid under exposure to actinic radiation, acid generator FUJIFILM CORPORATION (JP) 2012-03-27 — — US disclosed
US-20080241749-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 — — US disclosed
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