SCHEMBL825407

SCHEMBL825407

CCC(C)(C)C(=O)Nc1ccccc1OC(=O)c1ccccc1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 7/20 0.49
▸ LMNA P02545 2/20 0.49
▸ POLB P06746 2/20 0.49
▸ NPC1 O15118 2/20 0.49
▸ RAB9A P51151 2/20 0.49
▸ NR1I2 O75469 1/20 0.49
▸ TP53 P04637 1/20 0.49
▸ AHR P35869 1/20 0.49
▸ TAAR1 Q96RJ0 1/20 0.49
▸ SLC6A3 Q01959 1/20 0.48
▸ ALDH1A1 P00352 2/20 0.45
▸ MAPT P10636 3/20 0.45
▸ SMN1; SMN2 Q16637 2/20 0.45
▸ RIPK1 Q13546 1/20 0.44
▸ MEN1 O00255 3/20 0.44
▸ HSD17B10 Q99714 1/20 0.44
▸ PDK1 Q15118 1/20 0.43
▸ PDK2 Q15119 1/20 0.43
▸ PDK3 Q15120 1/20 0.43
▸ PDK4 Q16654 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10027967 0.81 LMNA (0.49) KMT2ALMNAPOLBNPC1RAB9A
SCHEMBL10027971 0.80 LMNA (0.57) KMT2ALMNAPOLBNPC1RAB9A
SCHEMBL825408 0.79 MAPT (0.51) KMT2ALMNASLC6A3ALDH1A1MAPT
SCHEMBL825368 0.78 RAB9A (0.49) KMT2ALMNAPOLBNPC1RAB9A
SCHEMBL825443 0.78 KMT2A (0.56) KMT2ALMNANPC1RAB9AALDH1A1
SCHEMBL10930815 0.78 HSD17B10 (0.59) KMT2ALMNAPOLBNPC1RAB9A
SCHEMBL825497 0.78 MAPT (0.54) KMT2APOLBNPC1RAB9AALDH1A1
SCHEMBL20164222 0.78 KMT2A (0.54) KMT2ALMNAPOLBNPC1RAB9A
SCHEMBL27464722 0.78 KMT2A (0.60) KMT2ALMNANPC1RAB9ANR1I2
SCHEMBL10027970 0.77 LMNA (0.50) KMT2ALMNAPOLBNPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8142977-B2 mixture of resin which decomposes under acid under exposure to actinic radiation, acid generator FUJIFILM CORPORATION (JP) 2012-03-27 — — US disclosed
US-20080241749-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 — — US disclosed
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