SCHEMBL825435

SCHEMBL825435

CCC(C)C(=O)Oc1ccccc1C(=O)c1ccccc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 3/20 0.56
ABCB1 P08183 4/20 0.49
KDM4E B2RXH2 3/20 0.45
HPGD P15428 2/20 0.45
HSD17B10 Q99714 2/20 0.45
ALDH1A1 P00352 2/20 0.45
ESR1 P03372 1/20 0.45
ITGB3 P05106 1/20 0.45
ITGA2B P08514 1/20 0.45
HMGB1 P09429 1/20 0.45
TSHR P16473 1/20 0.45
GGT1 P19440 1/20 0.45
PTGS1 P23219 1/20 0.45
PTGS2 P35354 1/20 0.45
BLM P54132 1/20 0.45
NAPRT Q6XQN6 1/20 0.45
TDP1 Q9NUW8 1/20 0.45
MEN1 O00255 1/20 0.44
RECQL P46063 1/20 0.44
KMT2A Q03164 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1914219 0.85 SLC6A3 (0.51) ELANEKDM4EHPGDHSD17B10ALDH1A1
SCHEMBL16139538 0.83 KDM4E (0.49) ABCB1KDM4EHPGDHSD17B10ALDH1A1
SCHEMBL1914216 0.83 ELANE (0.44) ELANEKDM4EHPGDHSD17B10ALDH1A1
SCHEMBL15548526 0.82 KMT2A (0.49) KDM4EALDH1A1TSHRTDP1MEN1
SCHEMBL825445 0.82 MAPT (0.51) HSD17B10ALDH1A1ESR1TSHRTDP1
SCHEMBL1914005 0.82 ALDH1A1 (0.44) KDM4EHPGDHSD17B10ALDH1A1ESR1
SCHEMBL2588916 0.82 ELANE (0.59) ELANEABCB1KDM4EHPGDHSD17B10
SCHEMBL1683548 0.81 ELANE (0.62) ELANEABCB1KDM4EHPGDHSD17B10
SCHEMBL825450 0.81 HSD17B10 (0.51) KDM4EHPGDHSD17B10ALDH1A1ESR1
SCHEMBL15789867 0.81 ELANE (0.42) ELANEABCB1KDM4EHPGDHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8142977-B2 mixture of resin which decomposes under acid under exposure to actinic radiation, acid generator FUJIFILM CORPORATION (JP) 2012-03-27 US disclosed
US-20080241749-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed