Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RXRA | P19793 | 2/20 | 0.52 |
| ▸ | RXRB | P28702 | 2/20 | 0.52 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.46 |
| ▸ | MAPT | P10636 | 1/20 | 0.46 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.46 |
| ▸ | PTPN5 | P54829 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9405718 | 0.89 | HPGD (0.50) | RXRARXRBFFAR4 | |
| SCHEMBL9405721 | 0.89 | HPGD (0.50) | RXRARXRBFFAR4 | |
| SCHEMBL17138193 | 0.87 | KMT2A (0.47) | MAPT | |
| SCHEMBL825538 | 0.86 | MAPT (0.56) | MAPTPTGS2 | |
| SCHEMBL17617137 | 0.85 | ELANE (0.50) | MAPT | |
| SCHEMBL650639 | 0.85 | ELANE (0.50) | MAPT | |
| SCHEMBL14996055 | 0.85 | ELANE (0.50) | MAPT | |
| SCHEMBL7182961 | 0.84 | RXRA (0.58) | RXRARXRBMAPTPTPN5 | |
| SCHEMBL825491 | 0.82 | KMT2A (0.53) | MAPT | |
| SCHEMBL825541 | 0.82 | ELANE (0.54) | MAPTPTGS2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8541161-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same and pattern forming method | FUJIFILM CORPORATION (JP) | 2013-09-24 | — | — | US | disclosed |
| US-8142977-B2 | mixture of resin which decomposes under acid under exposure to actinic radiation, acid generator | FUJIFILM CORPORATION (JP) | 2012-03-27 | — | — | US | disclosed |
| US-20120003586-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2012-01-05 | — | — | US | disclosed |
| US-20080241749-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |
| CN-1103332-C | Biphenyl-5-alkanoic acid derivs. and use thereof | ASAHI CHEMICAL IND (JP) | 2003-03-19 | — | — | CN | disclosed |
| CN-1276778-A | Biphenyl-5-alkanoic acid derivs. and use thereof | ASAHI CHEMICAL IND (JP) | 2000-12-13 | — | — | CN | disclosed |