SCHEMBL825512

SCHEMBL825512

CCC(C)c1ccc(OCOc2ccc(C(=O)c3ccccc3)cc2)cc1

nearest known ligand 0.60

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.60
TSHR P16473 1/20 0.60
RAB9A P51151 4/20 0.52
NPC1 O15118 2/20 0.52
GAA P10253 2/20 0.51
L3MBTL1 Q9Y468 5/20 0.50
HTT P42858 3/20 0.50
SMN1; SMN2 Q16637 3/20 0.50
ELANE P08246 3/20 0.50
LMNA P02545 2/20 0.50
MAPT P10636 2/20 0.50
MAPK1 P28482 1/20 0.50
ABCB1 P08183 1/20 0.50
MEN1 O00255 2/20 0.48
KMT2A Q03164 2/20 0.48
TDP1 Q9NUW8 1/20 0.48
PPARA Q07869 1/20 0.48
HSP90AA1 P07900 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4762195 0.88 ALDH1A1 (0.58) ALDH1A1TSHRRAB9ANPC1HTT
SCHEMBL10178585 0.88 ALDH1A1 (0.67) ALDH1A1TSHRRAB9ANPC1GAA
SCHEMBL825494 0.85 ALDH1A1 (0.60) ALDH1A1TSHRRAB9ANPC1GAA
SCHEMBL13144217 0.84 ELANE (0.56) ALDH1A1TSHRRAB9ANPC1L3MBTL1
SCHEMBL13144222 0.84 LMNA (0.53) ALDH1A1TSHRRAB9ANPC1GAA
SCHEMBL10178650 0.82 ALDH1A1 (0.54) ALDH1A1TSHRRAB9ANPC1GAA
SCHEMBL14252162 0.82 LMNA (0.51) ALDH1A1TSHRRAB9ANPC1GAA
SCHEMBL11113379 0.81 ALDH1A1 (0.62) ALDH1A1TSHRRAB9ANPC1GAA
SCHEMBL9101659 0.81 ALDH1A1 (0.53) ALDH1A1TSHRRAB9ANPC1GAA
SCHEMBL825567 0.80 ALDH1A1 (0.55) ALDH1A1TSHRRAB9ANPC1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8142977-B2 mixture of resin which decomposes under acid under exposure to actinic radiation, acid generator FUJIFILM CORPORATION (JP) 2012-03-27 US disclosed
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-20080241749-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed