SCHEMBL10178650

SCHEMBL10178650

CCC(C)c1ccc(COCCOc2ccc(C(=O)c3ccccc3)cc2)cc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.54
RAB9A P51151 3/20 0.54
MAPT P10636 3/20 0.54
HTT P42858 2/20 0.54
SMN1; SMN2 Q16637 2/20 0.54
GAA P10253 2/20 0.54
L3MBTL1 Q9Y468 5/20 0.53
NPC1 O15118 2/20 0.53
LMNA P02545 3/20 0.51
MAPK1 P28482 1/20 0.51
PPARG P37231 4/20 0.51
TSHR P16473 1/20 0.50
PPARA Q07869 2/20 0.49
PPARD Q03181 1/20 0.49
HSP90AA1 P07900 1/20 0.48
RXRA P19793 1/20 0.47
RXRB P28702 1/20 0.47
SRD5A2 P31213 1/20 0.47
MEN1 O00255 1/20 0.46
KMT2A Q03164 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10178585 0.89 ALDH1A1 (0.67) ALDH1A1RAB9AMAPTHTTSMN1; SMN2
SCHEMBL10178729 0.88 L3MBTL1 (0.54) ALDH1A1RAB9AMAPTHTTSMN1; SMN2
SCHEMBL10178613 0.84 NPC1 (0.46) ALDH1A1RAB9AL3MBTL1NPC1PPARG
SCHEMBL14252162 0.84 LMNA (0.51) ALDH1A1RAB9AMAPTHTTSMN1; SMN2
SCHEMBL5727237 0.84 SRD5A2 (0.65) ALDH1A1RAB9AMAPTHTTSMN1; SMN2
SCHEMBL13144222 0.83 LMNA (0.53) ALDH1A1RAB9AMAPTSMN1; SMN2GAA
SCHEMBL825512 0.82 ALDH1A1 (0.60) ALDH1A1RAB9AMAPTHTTSMN1; SMN2
SCHEMBL6378011 0.82 SRD5A2 (0.63) ALDH1A1RAB9AMAPTHTTSMN1; SMN2
SCHEMBL4762195 0.79 ALDH1A1 (0.58) ALDH1A1RAB9AMAPTHTTSMN1; SMN2
SCHEMBL16591145 0.79 NPC1 (0.46) ALDH1A1RAB9AHTTSMN1; SMN2L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8124310-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-02-28 US disclosed
US-20090087784-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed