SCHEMBL825531

SCHEMBL825531

CCC(C)c1ccc(OCOc2cccc3ccccc23)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KCNA3 P22001 1/20 0.47
HTR1B P28222 10/20 0.46
NR2E1 Q9Y466 5/20 0.45
TSHR P16473 3/20 0.44
ALDH1A1 P00352 3/20 0.44
L3MBTL1 Q9Y468 1/20 0.42
HTR1D P28221 2/20 0.42
CYP2D6 P10635 4/20 0.42
SLC6A4 P31645 4/20 0.42
CYP1A2 P05177 3/20 0.42
ADRB2 P07550 3/20 0.42
ADRB1 P08588 3/20 0.42
HTR2B P41595 3/20 0.42
SIGMAR1 Q99720 3/20 0.42
ADRB3 P13945 2/20 0.42
HTR2A P28223 2/20 0.42
HTR2C P28335 2/20 0.42
SCN1A P35498 2/20 0.42
HTR6 P50406 2/20 0.42
SLC10A1 Q14973 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL825351 0.86 KCNA3 (0.44) KCNA3HTR1BNR2E1ALDH1A1HTR1D
SCHEMBL14118495 0.85 KCNA3 (0.43) KCNA3HTR1BNR2E1TSHRALDH1A1
SCHEMBL14665257 0.84 CARM1 (0.50) KCNA3HTR1BNR2E1TSHRALDH1A1
SCHEMBL14118594 0.83 ALDH1A1 (0.44) TSHRALDH1A1L3MBTL1LMNATP53
SCHEMBL14118678 0.83 MAPT (0.54) TSHRALDH1A1SMN1; SMN2LMNATP53
SCHEMBL14118668 0.82 DRD4 (0.43) KCNA3HTR1BNR2E1TSHRALDH1A1
SCHEMBL13683030 0.82 ALDH1A1 (0.41) TSHRALDH1A1L3MBTL1SLC6A4HTR2A
SCHEMBL14118583 0.81 ALDH1A1 (0.41) TSHRALDH1A1L3MBTL1SMN1; SMN2KCNH2
SCHEMBL825406 0.81 ALDH1A1 (0.48) TSHRALDH1A1L3MBTL1CYP1A2ADRB2
SCHEMBL825489 0.81 ALDH1A1 (0.48) TSHRALDH1A1L3MBTL1CYP1A2SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8735048-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the composition and pattern forming method FUJIFILM CORPORATION (JP) 2014-05-27 US disclosed
US-20120301817-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE COMPOSITION AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2012-11-29 US disclosed
US-8142977-B2 mixture of resin which decomposes under acid under exposure to actinic radiation, acid generator FUJIFILM CORPORATION (JP) 2012-03-27 US disclosed
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-20080241749-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed