SCHEMBL13683030

SCHEMBL13683030

CCC(C)c1ccc(OCOc2ccc3cccc(OC)c3c2)cc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.41
TSHR P16473 1/20 0.41
TP53 P04637 2/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
NQO1 P15559 1/20 0.40
PTPRE P23469 1/20 0.38
MAPT P10636 4/20 0.38
GAA P10253 1/20 0.38
LMNA P02545 1/20 0.38
ALOX12 P18054 1/20 0.38
MEN1 O00255 2/20 0.37
KMT2A Q03164 2/20 0.37
KDM4E B2RXH2 1/20 0.37
POLB P06746 1/20 0.37
ABCB11 O95342 1/20 0.36
HTR2A P28223 2/20 0.36
BCHE P06276 1/20 0.36
ACHE P22303 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
MTNR1A P48039 3/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13683035 0.84 ABCB11 (0.42) ALDH1A1MAPTMEN1KMT2AKDM4E
SCHEMBL825545 0.84 ALDH1A1 (0.45) ALDH1A1TSHRTP53SMN1; SMN2MAPT
SCHEMBL13683034 0.82 ALDH1A1 (0.44) ALDH1A1TSHRTP53SMN1; SMN2NQO1
SCHEMBL825531 0.82 KCNA3 (0.47) ALDH1A1TSHRTP53SMN1; SMN2LMNA
SCHEMBL14118678 0.81 MAPT (0.54) ALDH1A1TSHRTP53SMN1; SMN2NQO1
SCHEMBL825353 0.81 ALDH1A1 (0.49) ALDH1A1TSHRTP53SMN1; SMN2GAA
SCHEMBL825489 0.80 ALDH1A1 (0.48) ALDH1A1TSHRTP53SMN1; SMN2PTPRE
SCHEMBL825487 0.80 ALDH1A1 (0.48) ALDH1A1TSHRSMN1; SMN2MAPTGAA
SCHEMBL14118594 0.79 ALDH1A1 (0.44) ALDH1A1TSHRTP53NQO1PTPRE
SCHEMBL825656 0.79 ABCB11 (0.51) ALDH1A1TSHRSMN1; SMN2MAPTGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed