SCHEMBL825489

SCHEMBL825489

CCC(C)c1ccc(OCOc2ccccc2OC)cc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.48
TSHR P16473 1/20 0.48
PTPRE P23469 1/20 0.45
MAPT P10636 4/20 0.44
GAA P10253 1/20 0.43
LMNA P02545 4/20 0.43
TP53 P04637 1/20 0.43
ALOX12 P18054 1/20 0.43
MEN1 O00255 1/20 0.41
KMT2A Q03164 1/20 0.41
TDP1 Q9NUW8 1/20 0.41
L3MBTL1 Q9Y468 3/20 0.41
MAPK1 P28482 1/20 0.41
HTT P42858 1/20 0.41
NPC1 O15118 2/20 0.40
RAB9A P51151 2/20 0.40
HSP90AA1 P07900 1/20 0.40
SLC7A5 Q01650 1/20 0.40
AGTR1 P30556 1/20 0.40
CYP1A2 P05177 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13683034 0.87 ALDH1A1 (0.44) ALDH1A1TSHRPTPREMAPTGAA
SCHEMBL14118594 0.87 ALDH1A1 (0.44) ALDH1A1TSHRPTPREMAPTGAA
SCHEMBL825406 0.85 ALDH1A1 (0.48) ALDH1A1TSHRPTPREMEN1KMT2A
SCHEMBL825494 0.84 ALDH1A1 (0.60) ALDH1A1TSHRMAPTGAALMNA
SCHEMBL825588 0.84 ALDH1A1 (0.58) ALDH1A1TSHRMAPTGAAMEN1
SCHEMBL11113379 0.83 ALDH1A1 (0.62) ALDH1A1TSHRMAPTGAALMNA
SCHEMBL14118678 0.82 MAPT (0.54) ALDH1A1TSHRPTPREMAPTGAA
SCHEMBL14118566 0.81 ALDH1A1 (0.48) ALDH1A1TSHRMAPTLMNATP53
SCHEMBL825531 0.81 KCNA3 (0.47) ALDH1A1TSHRLMNATP53L3MBTL1
SCHEMBL13683030 0.80 ALDH1A1 (0.41) ALDH1A1TSHRPTPREMAPTGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8142977-B2 mixture of resin which decomposes under acid under exposure to actinic radiation, acid generator FUJIFILM CORPORATION (JP) 2012-03-27 US disclosed
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-20080241749-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed