SCHEMBL825588

SCHEMBL825588

CCC(C)c1ccc(OCOc2ccc(OC)cc2)cc1

nearest known ligand 0.58

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.58
GAA P10253 2/20 0.58
MAPT P10636 1/20 0.58
TSHR P16473 1/20 0.56
MIF P14174 1/20 0.47
MEN1 O00255 1/20 0.47
KMT2A Q03164 1/20 0.47
TDP1 Q9NUW8 1/20 0.47
NPC1 O15118 2/20 0.46
RAB9A P51151 2/20 0.46
HSP90AA1 P07900 1/20 0.46
L3MBTL1 Q9Y468 1/20 0.46
NPBWR1 P48145 1/20 0.44
MCHR1 Q99705 1/20 0.44
HPGD P15428 1/20 0.44
SMN1; SMN2 Q16637 1/20 0.44
CYP17A1 P05093 1/20 0.42
FFAR1 O14842 1/20 0.42
ABCB1 P08183 2/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11113379 0.92 ALDH1A1 (0.62) ALDH1A1GAAMAPTTSHRMEN1
SCHEMBL10172019 0.90 ALDH1A1 (0.67) ALDH1A1GAAMAPTTSHRMIF
SCHEMBL10172018 0.90 ALDH1A1 (0.67) ALDH1A1GAAMAPTTSHRMIF
SCHEMBL690069 0.90 ALDH1A1 (0.67) ALDH1A1GAAMAPTTSHRMIF
SCHEMBL825487 0.87 ALDH1A1 (0.48) ALDH1A1GAAMAPTTSHRMEN1
SCHEMBL12259611 0.87 ALDH1A1 (0.57) ALDH1A1GAAMAPTTSHRMEN1
SCHEMBL825656 0.86 ABCB11 (0.51) ALDH1A1GAAMAPTTSHRRAB9A
SCHEMBL825526 0.85 ALDH1A1 (0.56) ALDH1A1GAAMAPTTSHRMEN1
SCHEMBL825494 0.85 ALDH1A1 (0.60) ALDH1A1GAAMAPTTSHRMEN1
SCHEMBL15613870 0.84 FFAR1 (0.59) ALDH1A1GAAMAPTTSHRNPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8142977-B2 mixture of resin which decomposes under acid under exposure to actinic radiation, acid generator FUJIFILM CORPORATION (JP) 2012-03-27 US disclosed
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
US-20080241749-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed