SCHEMBL825487

SCHEMBL825487

CCC(C)c1ccc(OCOc2cccc(OC)c2)cc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.48
TSHR P16473 2/20 0.48
MAPT P10636 2/20 0.47
MEN1 O00255 2/20 0.47
KMT2A Q03164 2/20 0.47
KDM4E B2RXH2 2/20 0.47
POLB P06746 1/20 0.47
GAA P10253 2/20 0.47
MTNR1A P48039 3/20 0.46
MTNR1B P49286 3/20 0.46
MAPK1 P28482 2/20 0.44
HPGD P15428 1/20 0.44
SMN1; SMN2 Q16637 1/20 0.44
MAOB P27338 3/20 0.44
NPSR1 Q6W5P4 1/20 0.43
LMNA P02545 1/20 0.43
CYP1A2 P05177 1/20 0.43
CYP3A4 P08684 1/20 0.43
CYP2C9 P11712 1/20 0.43
CYP2C19 P33261 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL825588 0.87 ALDH1A1 (0.58) ALDH1A1TSHRMAPTMEN1KMT2A
SCHEMBL825656 0.87 ABCB11 (0.51) ALDH1A1TSHRMAPTGAAHPGD
SCHEMBL825483 0.85 ALDH1A1 (0.48) ALDH1A1TSHRMEN1KMT2AGAA
SCHEMBL14118434 0.84 AKR1C3 (0.43) ALDH1A1TSHRMAPTMEN1KMT2A
SCHEMBL825494 0.84 ALDH1A1 (0.60) ALDH1A1TSHRMAPTMEN1KMT2A
SCHEMBL11113379 0.83 ALDH1A1 (0.62) ALDH1A1TSHRMAPTMEN1KMT2A
SCHEMBL825353 0.80 ALDH1A1 (0.49) ALDH1A1TSHRMEN1KMT2AKDM4E
SCHEMBL2758470 0.80 NPSR1 (0.49) ALDH1A1TSHRMAPTMEN1KMT2A
SCHEMBL13683030 0.80 ALDH1A1 (0.41) ALDH1A1TSHRMAPTMEN1KMT2A
SCHEMBL11306471 0.80 MAOB (0.62) ALDH1A1TSHRKDM4EMTNR1AMTNR1B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8142977-B2 mixture of resin which decomposes under acid under exposure to actinic radiation, acid generator FUJIFILM CORPORATION (JP) 2012-03-27 US disclosed
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-20080241749-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed