SCHEMBL825656

SCHEMBL825656

CCC(C)c1ccc(OCOc2ccc3ccc(OC)cc3c2)cc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ABCB11 O95342 1/20 0.51
AKR1C3 P42330 6/20 0.47
AKR1C2 P52895 6/20 0.47
PTGS1 P23219 3/20 0.47
AKR1C1 Q04828 1/20 0.47
ALDH1A1 P00352 3/20 0.47
TSHR P16473 3/20 0.47
GAA P10253 2/20 0.46
MAPT P10636 2/20 0.46
HPGD P15428 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.43
PTGS2 P35354 3/20 0.43
CYP1A2 P05177 2/20 0.43
CYP2A6 P11509 1/20 0.43
CDC42 P60953 1/20 0.43
RAC1 P63000 1/20 0.43
SLC22A6 Q4U2R8 1/20 0.43
RAB9A P51151 1/20 0.42
ALOX5 P09917 1/20 0.42
LMNA P02545 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL825353 0.88 ALDH1A1 (0.49) AKR1C3AKR1C2ALDH1A1TSHRGAA
SCHEMBL825487 0.87 ALDH1A1 (0.48) ABCB11ALDH1A1TSHRGAAMAPT
SCHEMBL825588 0.86 ALDH1A1 (0.58) ALDH1A1TSHRGAAMAPTHPGD
SCHEMBL825663 0.86 ALDH1A1 (0.48) ABCB11AKR1C3AKR1C2ALDH1A1TSHR
SCHEMBL9009741 0.82 ABCB11 (0.72) ABCB11AKR1C3AKR1C2PTGS1AKR1C1
SCHEMBL28346869 0.82 ABCB11 (0.72) ABCB11AKR1C3AKR1C2PTGS1AKR1C1
SCHEMBL11113379 0.82 ALDH1A1 (0.62) ALDH1A1TSHRGAAMAPTSMN1; SMN2
SCHEMBL11999045 0.81 AKR1C3 (0.48) ABCB11AKR1C3AKR1C2PTGS1AKR1C1
SCHEMBL2758476 0.80 ABCB11 (0.44) ABCB11AKR1C3AKR1C2PTGS1AKR1C1
SCHEMBL14118314 0.80 SLC6A2 (0.46) ABCB11AKR1C3AKR1C2ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8142977-B2 mixture of resin which decomposes under acid under exposure to actinic radiation, acid generator FUJIFILM CORPORATION (JP) 2012-03-27 US disclosed
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
US-20080241749-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed