SCHEMBL825598

SCHEMBL825598

CCC(C)c1ccc(OCOc2ccc(Cl)cc2)cc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.54
TSHR P16473 1/20 0.54
MAPT P10636 2/20 0.51
MEN1 O00255 3/20 0.46
KMT2A Q03164 3/20 0.46
TDP1 Q9NUW8 1/20 0.46
KCNH2 Q12809 1/20 0.45
RAB9A P51151 3/20 0.43
NPC1 O15118 2/20 0.43
GAA P10253 1/20 0.42
HSP90AA1 P07900 1/20 0.42
L3MBTL1 Q9Y468 1/20 0.42
ORAI1 Q96D31 1/20 0.41
SMN1; SMN2 Q16637 2/20 0.41
CRHBP P24387 1/20 0.41
CRHR2 Q13324 1/20 0.41
SCN4A P35499 2/20 0.40
ADRB2 P07550 1/20 0.39
LMNA P02545 1/20 0.39
FFAR1 O14842 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11113379 0.91 ALDH1A1 (0.62) ALDH1A1TSHRMAPTMEN1KMT2A
SCHEMBL14461695 0.85 MAOB (0.56) ALDH1A1TSHRMAPTMEN1KMT2A
SCHEMBL14705838 0.84 ADRB2 (0.52) ALDH1A1TSHRMAPTMEN1KMT2A
SCHEMBL2632879 0.84 ADRB2 (0.52) ALDH1A1TSHRMAPTMEN1KMT2A
SCHEMBL10192291 0.84 ADRB2 (0.52) ALDH1A1TSHRMAPTMEN1KMT2A
SCHEMBL825494 0.84 ALDH1A1 (0.60) ALDH1A1TSHRMAPTMEN1KMT2A
SCHEMBL825588 0.84 ALDH1A1 (0.58) ALDH1A1TSHRMAPTMEN1KMT2A
SCHEMBL825526 0.84 ALDH1A1 (0.56) ALDH1A1TSHRMAPTMEN1KMT2A
SCHEMBL12259611 0.81 ALDH1A1 (0.57) ALDH1A1TSHRMAPTMEN1KMT2A
SCHEMBL12587683 0.81 ALDH1A1 (0.57) ALDH1A1TSHRMAPTMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8142977-B2 mixture of resin which decomposes under acid under exposure to actinic radiation, acid generator FUJIFILM CORPORATION (JP) 2012-03-27 US disclosed
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
US-20080241749-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed