Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ADRB2 | P07550 | 1/20 | 0.52 |
| ▸ | C3AR1 | Q16581 | 1/20 | 0.44 |
| ▸ | TSHR | P16473 | 4/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.44 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.44 |
| ▸ | HPGD | P15428 | 2/20 | 0.44 |
| ▸ | USP2 | O75604 | 1/20 | 0.44 |
| ▸ | GAA | P10253 | 1/20 | 0.44 |
| ▸ | PKM | P14618 | 1/20 | 0.44 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.44 |
| ▸ | ABCB1 | P08183 | 1/20 | 0.43 |
| ▸ | MAPT | P10636 | 1/20 | 0.43 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.43 |
| ▸ | MEN1 | O00255 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.42 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.42 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14705838 | 1.00 | ADRB2 (0.52) | ADRB2C3AR1TSHRALDH1A1CYP2C9 | |
| SCHEMBL10192291 | 1.00 | ADRB2 (0.52) | ADRB2C3AR1TSHRALDH1A1CYP2C9 | |
| SCHEMBL25671392 | 0.93 | ADRB2 (0.46) | ADRB2C3AR1TSHRALDH1A1CYP2C9 | |
| SCHEMBL23134953 | 0.89 | ADRB2 (0.43) | ADRB2C3AR1TSHRALDH1A1CYP2C9 | |
| SCHEMBL598140 | 0.87 | ALDH1A1 (0.52) | TSHRALDH1A1CYP2C9HPGDUSP2 | |
| SCHEMBL825598 | 0.84 | ALDH1A1 (0.54) | ADRB2TSHRALDH1A1GAAMAPT | |
| SCHEMBL9906971 | 0.84 | MAPK1 (0.50) | TSHRALDH1A1CYP2C9HPGDUSP2 | |
| SCHEMBL11602428 | 0.84 | ALDH1A1 (0.47) | TSHRALDH1A1CYP2C9HPGDUSP2 | |
| SCHEMBL27720568 | 0.82 | ADRB2 (0.45) | ADRB2C3AR1TSHRHPGDABCB1 | |
| Hydrogen Peroxide SCHEMBL11434421 | 0.81 | ALDH1A1 (0.59) | TSHRALDH1A1CYP2C9HPGDUSP2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 336 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240241444-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2024-07-18 | — | — | US | disclosed |
| US-12037323-B2 | Uracil derivatives as Mer-AXL inhibitors | BRISTOL-MYERS SQUIBB COMPANY (US) | 2024-07-16 | — | — | US | disclosed |
| US-12032288-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-07-09 | — | — | US | disclosed |
| US-20240219831-A1 | PATTERN FORMING METHOD AND METHOD FOR PRODUCING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2024-07-04 | — | — | US | disclosed |
| US-11914300-B2 | Manufacturing method of semiconductor chip, and kit | FUJIFILM CORPORATION (JP) | 2024-02-27 | — | — | US | disclosed |
| US-20240027908-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20230400769-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-12-14 | — | — | US | disclosed |
| US-11835849-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2023-12-05 | — | — | US | disclosed |
| US-20230384674-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-11-30 | — | — | US | disclosed |
| US-20230367212-A1 | PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-11-16 | — | — | US | disclosed |
| US-7183044-B2 | Silver halide color photographic light-sensitive material | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-27 | — | — | US | disclosed |
| US-20070032531-A1 | SPHINGOSINE KINASE INHIBITORS AND METHODS OF THEIR USE | APOGEE BIOTECHNOLOGY CORPORATION (US) | 2007-02-08 | — | — | US | disclosed |
| EP-0985649-B1 | Method for producing an aromatic compound having an alkyl group with at least three carbon atoms | TORAY INDUSTRIES (JP) | 2004-11-24 | — | — | EP | disclosed |
| US-6462248-B1 | THROUGH CONVERSION, ISOMERIZATION AND/OR ADSORPTIVE SEPARATION OF AROMATIC COMPOUNDS | TORAY INDUSTRIES, INC. (JP) | 2002-10-08 | — | — | US | disclosed |
| CN-1333761-A | Isothiazolecarboxylic acid derivatives | BAYER AGROCHEM KK (JP) | 2002-01-30 | — | — | CN | disclosed |
| EP-0985649-A2 | Method for producing an aromatic compound having an alkyl group with at least three carbon atoms | TORAY INDUSTRIES, INC. (JP) | 2000-03-15 | — | — | EP | disclosed |
| EP-0635485-B1 | TETRAHYDROPHTHALAMIDE DERIVATIVE, INTERMEDIATE FOR PRODUCING THE SAME, PRODUCTION OF BOTH, AND HERBICIDE CONTAINING THE SAME AS ACTIVE INGREDIENT | SAGAMI CHEM RES (JP) | 1997-06-11 | — | — | EP | disclosed |
| US-5554581-A | Tetrahydrophthalamide derivative, intermediate for producing the same, production of both, and herbicide containing the same as active ingredient | SAGAMI CHEMICAL RESEARCH CENTER (JP) | 1996-09-10 | — | — | US | disclosed |
| US-5506190-A | Tetrahydrophthalamide derivative, intermediate for producing the same, production of both, and herbicide containing the same as active ingredient | SAGAMI CHEMICAL RESEARCH CENTER (JP) | 1996-04-09 | — | — | US | disclosed |
| EP-0635485-A1 | TETRAHYDROPHTHALAMIDE DERIVATIVE, INTERMEDIATE FOR PRODUCING THE SAME, PRODUCTION OF BOTH, AND HERBICIDE CONTAINING THE SAME AS ACTIVE INGREDIENT | SAGAMI CHEMICAL RESEARCH CENTER (JP) | 1995-01-25 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20070032531-A1 | SPHINGOSINE KINASE INHIBITORS AND METHODS OF THEIR USE | SPHK1, SPHK2, S1PR2 | ADRB2 2305/4885C3AR1 1321/4885TSHR 4420/4885 |
| US-12037323-B2 | Uracil derivatives as Mer-AXL inhibitors | MERTK, DAPK1, AXL | ADRB2 4006/4885C3AR1 2864/4885TSHR 3466/4885 |
| US-11835849-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | RER1, TERB1, TRRAP | ADRB2 4045/4885C3AR1 3633/4885TSHR 1473/4885 |
| US-12032288-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | RER1, COL1A1, RAD51 | ADRB2 2040/4885C3AR1 1968/4885TSHR 3144/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.