SCHEMBL826993

SCHEMBL826993

O=C(c1ccccc1)C(O)(c1ccccc1)S(=O)(=O)O

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES1 P23141 4/20 0.46
SRC P12931 1/20 0.42
TSHR P16473 3/20 0.38
CES2 O00748 2/20 0.38
DAO P14920 1/20 0.38
NAPRT Q6XQN6 1/20 0.38
ALDH1A1 P00352 1/20 0.38
PTPN1 P18031 1/20 0.38
HSD11B1 P28845 1/20 0.37
SMN1; SMN2 Q16637 2/20 0.37
HTT P42858 1/20 0.37
CYP1A2 P05177 1/20 0.36
CYP2D6 P10635 1/20 0.36
MAPK1 P28482 1/20 0.36
L3MBTL1 Q9Y468 3/20 0.35
MAPT P10636 2/20 0.35
TDP1 Q9NUW8 2/20 0.35
POLB P06746 1/20 0.35
CYP3A4 P08684 1/20 0.35
PARP1 P09874 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL251609 0.83 CA2 (0.46) CES1SRCTSHRCES2DAO
SCHEMBL3631032 0.83 CES1 (0.49) CES1SRCTSHRCES2DAO
SCHEMBL27701878 0.82 CYP1A2 (0.45) SRCTSHRALDH1A1PTPN1SMN1; SMN2
SCHEMBL11896557 0.79 CES1 (0.45) CES1SRCTSHRALDH1A1SMN1; SMN2
SCHEMBL16339816 0.79 CES1 (0.45) CES1SRCALDH1A1SMN1; SMN2HTT
SCHEMBL2593896 0.79 CES1 (0.44) CES1SRCTSHRDAONAPRT
SCHEMBL13281025 0.78 CES1 (0.40) CES1SRCALDH1A1PTPN1SMN1; SMN2
SCHEMBL11032447 0.76 CES1 (0.48) CES1SRCTSHRCES2DAO
SCHEMBL9560037 0.74 PTPN1 (0.44) SRCTSHRALDH1A1PTPN1HSD11B1
SCHEMBL13280384 0.74 ALDH1A1 (0.40) CES1SRCALDH1A1SMN1; SMN2MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 235 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115594875-A Anti-glare film coating liquid and anti-glare film 宁波甬安光科新材料科技有限公司(CN) 2023-01-13 CN claimed
CN-105404096-B Chemically amplified positive resist dry film, dry film laminate and method for producing laminate 信越化学工业株式会社 2021-07-16 CN claimed
JP-62094381-A None JP disclosed
CN-122072436-A Negative photosensitive resin composition, cured film, and resist film DIC株式会社 2026-05-22 CN disclosed
EP-3486693-B1 OPTICAL LAYERED BODY DAINIPPON PRINTING CO LTD (JP) 2026-04-01 EP disclosed
EP-4691763-A1 DECORATIVE SHEET AND DECORATIVE BOARD Dai Nippon Printing Co., Ltd. (JP) 2026-02-11 EP disclosed
US-20260020362-A1 RIBBED SUBSTRATE AND OPTICAL SEMICONDUCTOR DEVICE KANEKA CORP (JP) 2026-01-15 US disclosed
US-12493244-B2 Photosensitive resin composition, photosensitive dry film, and pattern formation method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-12-09 US disclosed
US-20250306404-A1 OPTICAL FILM, POLARIZER PROTECTIVE FILM, TRANSFER BODY FOR POLARIZER PROTECTIVE FILM, POLARIZATION PLATE, IMAGE DISPLAY DEVICE, AND METHOD FOR MANUFACTURING POLARIZER PROTECTIVE FILM DAINIPPON PRINTING CO LTD (JP) 2025-10-02 US disclosed
US-12379616-B2 Optical film, polarizer protective film, transfer body for polarizer protective film, polarization plate, image display device, and method for manufacturing polarizer protective film DAI NIPPON PRINTING CO., LTD. (JP) 2025-08-05 US disclosed
US-12365169-B2 Decorative sheet and decorative plate DAI NIPPON PRINTING CO., LTD. (JP) 2025-07-22 US disclosed
CN-1550896-A Processes for preparing photoresist compositions and the product ��Ļ���Ű˾ 2004-12-01 CN disclosed
US-6790525-B2 CROSSLINKED RESIN SURFACE PROTECTIVE LAYER; WEAR RESISTANCE; WALLS, FURNITURE DAI NIPPON PRINTING CO., LTD. (JP) 2004-09-14 US disclosed
US-20040023151-A1 Negative resist material and pattern formation method using the same SHIN-ETSU CHEMICAL CO., LTD. 2004-02-05 US disclosed
US-20020146573-A1 Polymer composition, cured product, laminate and method for producing the cured product JSR CORPORATION (JP) 2002-10-10 US disclosed
EP-1229092-A2 Polymer composition, cured product, laminate and method for producing the cured product JSR Corporation (JP) 2002-08-07 EP disclosed
US-20020059762-A1 Decorative material DAI NIPPON PRINTING CO., LTD. (JP) 2002-05-23 US disclosed
EP-0361351-A2 Application of a painted film to a three-dimensional object CIBA-GEIGY AG (CH) 1990-04-04 EP disclosed
US-4837350-A Process for the preparation of benzoin sulfonates CIBA-GEIGY CORPORATION (US) 1989-06-06 US disclosed
JP-S6294381-A THERMAL RECORDING MATERIAL HODOGAYA CHEM CO LTD 1987-04-30 JP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260020362-A1 RIBBED SUBSTRATE AND OPTICAL SEMICONDUCTOR DEVICE SOST, CASK, STRADA CES1 2022/4885SRC 249/4885TSHR 4144/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.