Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ADH1B | P00325 | 3/20 | 0.35 |
| ▸ | ADH1C | P00326 | 3/20 | 0.35 |
| ▸ | ADH1A | P07327 | 3/20 | 0.35 |
| ▸ | ADH7 | P40394 | 3/20 | 0.35 |
| ▸ | ADH4 | P08319 | 2/20 | 0.35 |
| ▸ | ATM | Q13315 | 1/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 3/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | DNM1 | Q05193 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.32 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.32 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.32 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.31 |
| ▸ | CA1 | P00915 | 1/20 | 0.31 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17169460 | 0.92 | DNM1 (0.42) | ADH1BADH1CADH1AADH7ADH4 | |
| SCHEMBL3366783 | 0.86 | — | — | |
| SCHEMBL443270 | 0.80 | DNM1 (0.33) | ATMCYP3A4TSHRDNM1ALDH1A1 | |
| SCHEMBL292814 | 0.78 | TSHR (0.36) | ATMTSHRHPGDDNM1ALDH1A1 | |
| SCHEMBL8963410 | 0.78 | DNM1 (0.32) | ATMDNM1ALDH1A1ADRB2ADRB1 | |
| SCHEMBL115527 | 0.78 | LMNA (0.47) | ATMCYP3A4TSHRDNM1ALDH1A1 | |
| SCHEMBL8418753 | 0.77 | TSHR (0.35) | ADH1BADH1CADH1AADH7ADH4 | |
| SCHEMBL10636666 | 0.77 | DNM1 (0.31) | DNM1ADRB2ADRB1ADRB3 | |
| SCHEMBL19157890 | 0.77 | TSHR (0.34) | ADH1BADH1CADH1AADH7ADH4 | |
| SCHEMBL7095 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024101411-A1 | CURABLE COMPOSITION FOR ORGANIC EL ELEMENTS, CURED PRODUCT FOR ORGANIC EL ELEMENTS AND METHOD FOR PRODUCING SAME, ORGANIC EL ELEMENT, AND POLYMER | JSR株式会社 | 2024-05-16 | — | — | WO | disclosed |
| CN-117590689-A | Radiation-sensitive composition, cured film, method for producing same, display device, and curable resin composition | JSR株式会社 | 2024-02-23 | — | — | CN | disclosed |
| CN-117148680-A | Radiation-sensitive composition, cured film, method for producing cured film, liquid crystal display device, and organic EL display device | JSR株式会社 | 2023-12-01 | — | — | CN | disclosed |
| CN-115963697-A | Radiation-sensitive composition, cured film, method for producing cured film, and display device | JSR株式会社 | 2023-04-14 | — | — | CN | disclosed |
| CN-115704995-A | Curable composition, cured film and application thereof, method for producing cured film, and polymer | JSR株式会社 | 2023-02-17 | — | — | CN | disclosed |
| CN-115433591-A | Liquid crystal aligning agent, liquid crystal alignment film, liquid crystal element, polymer and method for producing same | JSR株式会社 | 2022-12-06 | — | — | CN | disclosed |
| CN-115268214-A | Radiation-sensitive composition, cured film and method for producing the same, semiconductor and display device | JSR株式会社 | 2022-11-01 | — | — | CN | disclosed |
| CN-115197719-A | Liquid crystal aligning agent, liquid crystal alignment film, liquid crystal element, and method for producing same | JSR株式会社 | 2022-10-18 | — | — | CN | disclosed |
| CN-114574223-A | Liquid crystal aligning agent, liquid crystal alignment film, and liquid crystal element | JSR株式会社 | 2022-06-03 | — | — | CN | disclosed |
| CN-106047371-B | Liquid crystal aligning agent, liquid crystal alignment film, and liquid crystal element | JSR株式会社 | 2020-04-21 | — | — | CN | disclosed |
| US-6403280-B1 | TERPOLYMER COMPRISING MALEIC ANHYDRIDE, NORBORNENE ESTER DERIVATIVE, AND ALICYCLIC (METH)ACRYLATE MONOMERS; DURABILITY TO DRY ETCHING; TRANSPARENCY, STORAGE STABILITY | JSR CORPORATION (JP) | 2002-06-11 | — | — | US | disclosed |
| US-6372854-B1 | POLYALKENAMERS USED AS PHOTORESISTS HAVING EXCELLENT OPTICAL ELECTRICAL PROPERTIES; HIGH RIGIDITY; HEAT RESISTANCE; ADHESION AND WEAR RESISTANCE; HYDROGENATION; ACIDOLYSIS | MITSUI CHEMICALS, INC. (JP) | 2002-04-16 | — | — | US | disclosed |
| US-20020009668-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-24 | — | — | US | disclosed |
| US-20020009667-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-24 | — | — | US | disclosed |
| EP-1164434-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |
| EP-1162506-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-12 | — | — | EP | disclosed |
| US-20010023050-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-09-20 | — | — | US | disclosed |
| EP-1122605-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| EP-1085379-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-03-21 | — | — | EP | disclosed |
| EP-1048983-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 2000-11-02 | — | — | EP | disclosed |