SCHEMBL7095

SCHEMBL7095

CCOC(C)OC=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethylene SCHEMBL27730761 0.95 LMNA (0.50)
SCHEMBL3366783 0.80
SCHEMBL4293299 0.78 LMNA (0.71)
Acetaldehyde SCHEMBL212729 0.78 LMNA (0.71)
SCHEMBL905728 0.77 ALDH1A1 (0.33)
SCHEMBL828246 0.77 ADH1B (0.35)
Isobutyraldehyde SCHEMBL427264 0.76 LMNA (0.67)
SCHEMBL5931991 0.76 THRB (0.53)
Propionaldehyde SCHEMBL1523503 0.76 LMNA (0.67)
SCHEMBL5333 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 169 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7847045-B2 Acrylic acid-based polymer and method of producing the same NIPPON SODA CO., LTD. (JP) 2010-12-07 US claimed
WO-2024101411-A1 CURABLE COMPOSITION FOR ORGANIC EL ELEMENTS, CURED PRODUCT FOR ORGANIC EL ELEMENTS AND METHOD FOR PRODUCING SAME, ORGANIC EL ELEMENT, AND POLYMER JSR株式会社 2024-05-16 WO disclosed
CN-117590689-A Radiation-sensitive composition, cured film, method for producing same, display device, and curable resin composition JSR株式会社 2024-02-23 CN disclosed
CN-117148680-A Radiation-sensitive composition, cured film, method for producing cured film, liquid crystal display device, and organic EL display device JSR株式会社 2023-12-01 CN disclosed
CN-115963697-A Radiation-sensitive composition, cured film, method for producing cured film, and display device JSR株式会社 2023-04-14 CN disclosed
CN-115704995-A Curable composition, cured film and application thereof, method for producing cured film, and polymer JSR株式会社 2023-02-17 CN disclosed
CN-115433591-A Liquid crystal aligning agent, liquid crystal alignment film, liquid crystal element, polymer and method for producing same JSR株式会社 2022-12-06 CN disclosed
CN-115268214-A Radiation-sensitive composition, cured film and method for producing the same, semiconductor and display device JSR株式会社 2022-11-01 CN disclosed
CN-115197719-A Liquid crystal aligning agent, liquid crystal alignment film, liquid crystal element, and method for producing same JSR株式会社 2022-10-18 CN disclosed
CN-114574223-A Liquid crystal aligning agent, liquid crystal alignment film, and liquid crystal element JSR株式会社 2022-06-03 CN disclosed
US-4931591-A Novel 5-amino-4-hydroxyvaleryl derivatives CIBA-GEIGY CORPORATION (US) 1990-06-05 US disclosed
US-4914129-A Antihypertensive 5-amino-4-hydroxyvaleryl derivatives substituted by sulphur-containing groups CIBA-GEIGY CORPORATION (US) 1990-04-03 US disclosed
US-4898977-A Processes for the preparation of 5-amino-4-hydroxyvaleric acid derivatives CIBA-GEIGY CORPORATION (US) 1990-02-06 US disclosed
US-4889869-A ANTIALDOSTERONISM AGENTS CIBA-GEIGY CORPORATION (US) 1989-12-26 US disclosed
US-4863903-A RENIN ENZYME INHIBITORS, HYPOTENSIVE AGENTS CIBA-GEIGY CORPORATION (US) 1989-09-05 US disclosed
US-4758584-A Antihypertensive 5-amino-4-hydroxyvaleryl derivatives substituted by sulphur-containing groups CIBA-GEIGY CORPORATION (US) 1988-07-19 US disclosed
EP-0258183-A2 Process for the preparation of 5-amino-4-hydroxyvaleric-acid derivatives CIBA-GEIGY AG (CH) 1988-03-02 EP disclosed
US-4727060-A HYPOTENSIVE AGENTS CIBA-GEIGY CORPORATION (US) 1988-02-23 US disclosed
US-4719288-A HYPOTENSIVE CIBA-GEIGY CORPORATION (US) 1988-01-12 US disclosed
US-4613676-A PEPTIDES CIBA-GEIGY CORPORATION (US) 1986-09-23 US disclosed