Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PKM | P14618 | 3/20 | 1.00 |
| ▸ | GAA | P10253 | 1/20 | 1.00 |
| ▸ | ELANE | P08246 | 2/20 | 0.61 |
| ▸ | LTA4H | P09960 | 1/20 | 0.59 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.59 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.56 |
| ▸ | CA2 | P00918 | 2/20 | 0.55 |
| ▸ | CA1 | P00915 | 1/20 | 0.55 |
| ▸ | MMP1 | P03956 | 1/20 | 0.55 |
| ▸ | MMP2 | P08253 | 1/20 | 0.55 |
| ▸ | MMP9 | P14780 | 1/20 | 0.55 |
| ▸ | MMP8 | P22894 | 1/20 | 0.55 |
| ▸ | MMP13 | P45452 | 1/20 | 0.55 |
| ▸ | APP | P05067 | 1/20 | 0.53 |
| ▸ | RAPGEF4 | Q8WZA2 | 1/20 | 0.53 |
| ▸ | POLB | P06746 | 1/20 | 0.52 |
| ▸ | MAPT | P10636 | 1/20 | 0.52 |
| ▸ | CYTH2 | Q99418 | 1/20 | 0.51 |
| ▸ | TUBB4A | P04350 | 1/20 | 0.51 |
| ▸ | TUBB | P07437 | 1/20 | 0.51 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19018111 | 0.94 | PKM (0.89) | PKMGAAELANELTA4HESR2 | |
| SCHEMBL25922128 | 0.89 | PKM (0.80) | PKMGAAELANELTA4HESR2 | |
| SCHEMBL14486413 | 0.89 | PKM (1.00) | PKMGAAHSD11B1CA2CA1 | |
| SCHEMBL13074716 | 0.89 | PKM (1.00) | PKMGAAHSD11B1CA2CA1 | |
| SCHEMBL835692 | 0.89 | PKM (1.00) | PKMGAAHSD11B1CA2CA1 | |
| SCHEMBL537312 | 0.88 | PKM (0.77) | PKMGAAELANELTA4HESR2 | |
| SCHEMBL16775430 | 0.88 | GAA (0.77) | PKMGAAELANELTA4HESR2 | |
| SCHEMBL7753235 | 0.87 | PKM (0.75) | PKMGAAAPPPOLBMAPT | |
| Mequinol SCHEMBL28697292 | 0.85 | PKM (0.74) | PKMGAALTA4HESR2CA2 | |
| Mequinol SCHEMBL23541071 | 0.85 | PKM (0.73) | PKMGAALTA4HESR2CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 422 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-6344671-A | — | — | None | — | — | JP | disclosed |
| JP-3216381-A | — | — | None | — | — | JP | disclosed |
| JP-3173689-A | — | — | None | — | — | JP | disclosed |
| US-12030328-B2 | Thermosensitive recording medium | RICOH COMPANY, LTD. (JP) | 2024-07-09 | — | — | US | disclosed |
| EP-3395583-B1 | HEAT-SENSITIVE RECORDING MATERIAL | NIPPON KAYAKU KK (JP) | 2024-03-27 | — | — | EP | disclosed |
| US-20240069441-A1 | COMPOSITION FOR RESIST UNDERLYING FILM FORMATION | NISSAN CHEMICAL CORPORATION (JP) | 2024-02-29 | — | — | US | disclosed |
| US-20240069441-A1 | COMPOSITION FOR RESIST UNDERLYING FILM FORMATION | NISSAN CHEMICAL CORPORATION (JP) | 2024-02-29 | — | — | US | disclosed |
| US-20240019779-A1 | COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-01-18 | — | — | US | disclosed |
| US-11815815-B2 | Composition for forming silicon-containing resist underlayer film removable by wet process | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2023-11-14 | — | — | US | disclosed |
| US-11815815-B2 | Composition for forming silicon-containing resist underlayer film removable by wet process | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2023-11-14 | — | — | US | disclosed |
| US-4616239-A | 4-hydroxy-4'-isopropoxydiphenylsulfone and its use for color-developable recording material | SHIN NISSO KAKO CO., LTD. (JP) | 1986-10-07 | — | — | US | disclosed |
| US-4611072-A | Heat-sensitive recording material | CIBA-GEIGY CORPORATION (US) | 1986-09-09 | — | — | US | disclosed |
| EP-0179492-A2 | Heat-sensitive recording material | KANZAKI PAPER MANUFACTURING COMPANY LIMITED (JP) | 1986-04-30 | — | — | EP | disclosed |
| US-4568766-A | HEAT-SENSITIVE MATERIAL | NIPPON SODA COMPANY LIMITED (JP) | 1986-02-04 | — | — | US | disclosed |
| US-4536779-A | PHENOLSULFONYL SALT AS DEVELOPER FOR COLOR FORMER | CIBA-GEIGY CORPORATION (US) | 1985-08-20 | — | — | US | disclosed |
| EP-0067793-B1 | PRESSURE OR HEAT SENSITIVE RECORDING MATERIALS | CIBA-GEIGY AG (CH) | 1985-04-17 | — | — | EP | disclosed |
| EP-0112291-A2 | Heat-sensitive registration material | CIBA-GEIGY AG (CH) | 1984-06-27 | — | — | EP | disclosed |
| US-4453744-A | Pressure-sensitive or heat-sensitive recording material | CIBA-GEIGY CORPORATION (US) | 1984-06-12 | — | — | US | disclosed |
| EP-0067793-A2 | Pressure or heat sensitive recording materials | CIBA-GEIGY AG (CH) | 1982-12-22 | — | — | EP | disclosed |
| US-4101323-A | Radiation-sensitive copying composition | HOECHST AKTIENGESELLSCHAFT (DE) | 1978-07-18 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240019779-A1 | COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME | CRY1, CCNT1, CCNA1 | PKM 1050/4885GAA 3580/4885ELANE 1993/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.