Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 5/20 | 0.45 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.44 |
| ▸ | POLB | P06746 | 1/20 | 0.44 |
| ▸ | APEX1 | P27695 | 1/20 | 0.44 |
| ▸ | HTT | P42858 | 1/20 | 0.44 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.38 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.38 |
| ▸ | HPGD | P15428 | 3/20 | 0.36 |
| ▸ | RAB9A | P51151 | 2/20 | 0.36 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.36 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.35 |
| ▸ | DHODH | Q02127 | 1/20 | 0.35 |
| ▸ | ELANE | P08246 | 1/20 | 0.35 |
| ▸ | ESR1 | P03372 | 1/20 | 0.35 |
| ▸ | CNR1 | P21554 | 1/20 | 0.35 |
| ▸ | CNR2 | P34972 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methacrylic Acid SCHEMBL4254749 | 0.88 | POLB (0.38) | TSHRTDP1POLBAPEX1HTT | |
| Methacrylic Acid SCHEMBL6815378 | 0.83 | ALDH1A1 (0.50) | TDP1ALDH1A1HPGDRAB9AHSD17B10 | |
| Methacrylic Acid SCHEMBL560416 | 0.83 | ALDH1A1 (0.50) | TDP1ALDH1A1HPGDRAB9AHSD17B10 | |
| Toluene SCHEMBL27885810 | 0.77 | TSHR (0.60) | TSHRTDP1POLBAPEX1HTT | |
| SCHEMBL15302742 | 0.77 | POLB (0.46) | TSHRTDP1POLBAPEX1HTT | |
| SCHEMBL15302149 | 0.77 | POLB (0.49) | TSHRTDP1POLBAPEX1HTT | |
| SCHEMBL29503685 | 0.77 | MTNR1A (0.44) | TSHRTDP1POLBAPEX1HTT | |
| Benzophenone SCHEMBL29144652 | 0.76 | ELANE (0.56) | TSHRTDP1POLBAPEX1HTT | |
| SCHEMBL29503732 | 0.76 | MTNR1A (0.46) | TSHRTDP1POLBAPEX1HTT | |
| Biphenyl SCHEMBL27963687 | 0.76 | TSHR (0.62) | TSHRTDP1POLBAPEX1HTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10754249-B2 | Coating compositions for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2020-08-25 | — | — | US | disclosed |
| CN-110488571-A | Coating composition for photoetching | ROHM & HAAS ELECT MAT | 2019-11-22 | — | — | CN | disclosed |
| US-10261418-B2 | Coating compositions for use with an overcoated photoresist | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2019-04-16 | — | — | US | disclosed |
| US-20170285478-A1 | COATING COMPOSITIONS FOR PHOTOLITHOGRAPHY | ROHM AND HAAS ELECTRONIC MATERIALS LLC | 2017-10-05 | — | — | US | disclosed |
| US-9690199-B2 | Coating compositions for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2017-06-27 | — | — | US | disclosed |
| US-20160363862-A1 | COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST | ROHM & HAAS ELECT MAT (US) | 2016-12-15 | — | — | US | disclosed |
| US-9429844-B2 | Coating compositions for use with an overcoated photoresist | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2016-08-30 | — | — | US | disclosed |
| US-20160223911-A1 | COATING COMPOSITIONS FOR PHOTOLITHOGRAPHY | ROHM & HAAS ELECT MAT (US) | 2016-08-04 | — | — | US | disclosed |
| US-9323154-B2 | Coating compositions for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS, LLC (US) | 2016-04-26 | — | — | US | disclosed |
| EP-1762895-B1 | Antireflective Hard Mask Compositions | ROHM & HAAS ELECT MAT (US) | 2016-02-24 | — | — | EP | disclosed |
| CN-101017326-A | Coating compositions for use with an overcoated photoresist | ROHM & HAAS ELECT MAT (US) | 2007-08-15 | — | — | CN | disclosed |
| US-20070178406-A1 | Coating compositions for use with an overcoated photoresist | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2007-08-02 | — | — | US | disclosed |
| EP-1813986-A2 | Coating compositions for use with an overcoated photoresist | Rohm and Haas Electronic Materials, L.L.C. (US) | 2007-08-01 | — | — | EP | disclosed |
| US-20070057253-A1 | Antireflective hard mask compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2007-03-15 | — | — | US | disclosed |
| EP-1762895-A1 | Antireflective Hard Mask Compositions | Rohm and Haas Electronic Materials, L.L.C. (US) | 2007-03-14 | — | — | EP | disclosed |
| EP-1742108-A1 | Coating compositions for use with an overcoated photoresist | Rohm and Haas Electronic Materials, L.L.C. (US) | 2007-01-10 | — | — | EP | disclosed |
| US-20060275696-A1 | Coating compositions for use with an overcoated photoresist | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2006-12-07 | — | — | US | disclosed |
| US-20060228646-A1 | Coating compositions for use with an overcoated photoresist | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2006-10-12 | — | — | US | disclosed |
| EP-1705519-A2 | Coating compositions for use with an overcoated photoresist | Rohm and Haas Electronic Materials, L.L.C. (US) | 2006-09-27 | — | — | EP | disclosed |
| EP-1691238-A2 | Coating compositions for use with an overcoated photoresist | Rohm and Haas Electronic Materials, L.L.C. (US) | 2006-08-16 | — | — | EP | disclosed |