Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | IDO1 | P14902 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12615990 | 0.85 | ALDH1A1 (0.38) | IDO1MEN1ALDH1A1KMT2AL3MBTL1 | |
| SCHEMBL9014087 | 0.85 | IDO1 (0.30) | IDO1 | |
| SCHEMBL3397570 | 0.76 | DCUN1D1 (0.47) | ALDH1A1 | |
| SCHEMBL1773419 | 0.76 | IDO1 (0.52) | IDO1MEN1ALDH1A1KMT2A | |
| SCHEMBL704887 | 0.76 | DCUN1D1 (0.47) | IDO1MEN1ALDH1A1KMT2A | |
| SCHEMBL23161505 | 0.76 | MEN1 (0.36) | IDO1MEN1ALDH1A1KMT2AL3MBTL1 | |
| SCHEMBL918324 | 0.76 | DCUN1D1 (0.47) | IDO1MEN1ALDH1A1KMT2A | |
| SCHEMBL7768911 | 0.76 | KCNN4 (0.35) | MEN1ALDH1A1KMT2AL3MBTL1 | |
| SCHEMBL1774388 | 0.76 | DCUN1D1 (0.47) | IDO1ALDH1A1KMT2A | |
| SCHEMBL9389043 | 0.76 | MEN1 (0.32) | MEN1ALDH1A1KMT2AL3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 183 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117739798-B | Preparation method of flexible resistance type strain sensor, prepared flexible resistance type strain sensor and application of flexible resistance type strain sensor | 暨南大学 | 2024-05-07 | — | — | CN | claimed |
| CN-117739798-A | Preparation method of flexible resistance type strain sensor, prepared flexible resistance type strain sensor and application of flexible resistance type strain sensor | 暨南大学 | 2024-03-22 | — | — | CN | claimed |
| CN-114958206-B | Copper chemical mechanical polishing solution and application thereof and chemical mechanical polishing method | 万华化学集团电子材料有限公司 | 2024-02-02 | — | — | CN | claimed |
| CN-116288360-A | Non-phosphating polishing additive and production process thereof | 江西宏伟龙科技有限公司 | 2023-06-23 | — | — | CN | claimed |
| CN-115466958-A | Chemical polishing bright additive for chemical polishing of aluminum alloy two acids and polishing process | 安徽韩铝环保新材料有限公司 | 2022-12-13 | — | — | CN | claimed |
| CN-114958206-A | Copper chemical mechanical polishing solution, application thereof and chemical mechanical polishing method | 万华化学集团电子材料有限公司 | 2022-08-30 | — | — | CN | claimed |
| CN-108250972-B | Chemical mechanical polishing solution for barrier layer planarization | 安集微电子科技（上海）股份有限公司 | 2021-09-21 | — | — | CN | claimed |
| CN-113122145-A | Chemical mechanical polishing solution | 安集微电子（上海）有限公司 | 2021-07-16 | — | — | CN | claimed |
| CN-109971355-A | A kind of chemical mechanical polishing liquid | 安集微电子（上海）有限公司 | 2019-07-05 | — | — | CN | claimed |
| CN-109971354-A | A kind of chemical mechanical polishing liquid | 安集微电子（上海）有限公司 | 2019-07-05 | — | — | CN | claimed |
| CN-106928855-A | A kind of acidic chemical machine polishing liquor | 安集微电子科技(上海)有限公司 | 2017-07-07 | — | — | CN | claimed |
| CN-106928857-A | A kind of acidic chemical machine polishing liquor | 安集微电子科技(上海)有限公司 | 2017-07-07 | — | — | CN | claimed |
| CN-106928858-A | A kind of chemical mechanical polishing liquid for barrier layer planarization | 安集微电子科技(上海)有限公司 | 2017-07-07 | — | — | CN | claimed |
| CN-106928862-A | A kind of chemical mechanical polishing liquid and its polish ULK- copper-connection processing procedures in barrier layer application | 安集微电子科技(上海)有限公司 | 2017-07-07 | — | — | CN | claimed |
| CN-106928856-A | A kind of acidic chemical machine polishing liquor | 安集微电子科技(上海)有限公司 | 2017-07-07 | — | — | CN | claimed |
| CN-105802512-A | Chemical mechanical polishing liquid and application thereof | 安集微电子（上海）有限公司 | 2016-07-27 | — | — | CN | claimed |
| CN-104745090-A | Chemically mechanical polishing liquid and application thereof | ANJI MICROELECTRONICS SHANGHAI | 2015-07-01 | — | — | CN | claimed |
| CN-104745086-A | Chemical mechanical polishing solution for barrier layer planarization, and use method thereof | ANJI MICROELECTRONICS SHANGHAI | 2015-07-01 | — | — | CN | claimed |
| CN-104745088-A | Chemical mechanical polishing solution for barrier layer planarization, and use method thereof | ANJI MICROELECTRONICS SHANGHAI | 2015-07-01 | — | — | CN | claimed |
| CN-104745089-A | Chemically mechanical polishing liquid for flattening barrier layer and use method thereof | ANJI MICROELECTRONICS SHANGHAI | 2015-07-01 | — | — | CN | claimed |