Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.44 |
| ▸ | GAA | P10253 | 1/20 | 0.43 |
| ▸ | PLA2G2A | P14555 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | MAPT | P10636 | 2/20 | 0.41 |
| ▸ | PLK1 | P53350 | 1/20 | 0.39 |
| ▸ | CREBBP | Q92793 | 2/20 | 0.39 |
| ▸ | BRD4 | O60885 | 1/20 | 0.39 |
| ▸ | BRD2 | P25440 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | HPGD | P15428 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | POLB | P06746 | 1/20 | 0.38 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.38 |
| ▸ | MAOB | P27338 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21110477 | 0.85 | KMT2A (0.54) | L3MBTL1GAAPLA2G2AKMT2AALDH1A1 | |
| SCHEMBL9702910 | 0.82 | PLA2G2A (0.56) | L3MBTL1GAAPLA2G2AKMT2AALDH1A1 | |
| SCHEMBL9970987 | 0.77 | PLA2G2A (0.64) | L3MBTL1GAAPLA2G2AALDH1A1MAPT | |
| SCHEMBL25574855 | 0.76 | ALDH1A1 (0.41) | GAAPLA2G2AALDH1A1MAPT | |
| SCHEMBL18531281 | 0.75 | PLA2G4B (0.55) | GAAKMT2AMAPTHPGDLMNA | |
| SCHEMBL11387851 | 0.75 | PLA2G2A (0.72) | L3MBTL1GAAPLA2G2AKMT2A | |
| SCHEMBL22779381 | 0.75 | KAT6A (0.53) | L3MBTL1GAAPLA2G2AKMT2AALDH1A1 | |
| SCHEMBL9679974 | 0.74 | LMNA (0.42) | L3MBTL1GAAPLA2G2AKMT2AALDH1A1 | |
| SCHEMBL10498963 | 0.74 | PLA2G2A (0.75) | L3MBTL1GAAPLA2G2A | |
| SCHEMBL19565362 | 0.74 | PLA2G2A (0.75) | L3MBTL1GAAPLA2G2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0675410-B1 | Resist composition for deep ultraviolet light | WAKO PURE CHEM IND LTD (JP) | 1999-08-04 | — | — | EP | disclosed |
| US-5780206-A | USING AN ANTHRACENE DERIVATIVE AS AN ABSORBER ON HIGHLY REFLECTIVE SURFACES; ALKALI-SOLUBLE POLYMERS; GENERATION OF ACID CATALYSTS; FINE PATTERNS | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1998-07-14 | — | — | US | disclosed |
| US-5695910-A | RESIN BECOMES ALKALI SOLUBLE BY ELIMINATING PROTECTIVE GROUPS BY ACTION OF IN SITU GENERATED ACID | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1997-12-09 | — | — | US | disclosed |
| EP-0579420-B1 | Negative working resist material and pattern forming process | WAKO PURE CHEM IND LTD (JP) | 1997-03-05 | — | — | EP | disclosed |
| EP-0675410-A1 | Resist composition for deep ultraviolet light | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1995-10-04 | — | — | EP | disclosed |
| US-5389491-A | Negative working resist composition | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1995-02-14 | — | — | US | disclosed |
| EP-0579420-A2 | Negative working resist material and pattern forming process | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1994-01-19 | — | — | EP | disclosed |