SCHEMBL8376236

SCHEMBL8376236

COc1cc(OC)c2cc(C(=O)c3cccs3)c(=O)oc2c1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPGD P15428 8/20 0.53
MAPT P10636 6/20 0.53
KMT2A Q03164 5/20 0.53
RAB9A P51151 4/20 0.53
NPC1 O15118 3/20 0.53
MEN1 O00255 3/20 0.53
MAOB P27338 4/20 0.48
MAOA P21397 1/20 0.48
ALDH1A1 P00352 8/20 0.46
KDM4E B2RXH2 6/20 0.46
CYP3A4 P08684 4/20 0.46
GLA P06280 3/20 0.46
HSD17B10 Q99714 1/20 0.46
L3MBTL1 Q9Y468 1/20 0.46
GAA P10253 3/20 0.46
POLB P06746 2/20 0.44
TSHR P16473 1/20 0.43
CYP2C19 P33261 2/20 0.43
TP53 P04637 1/20 0.43
MAPK1 P28482 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL556704 0.84 ALDH1A1 (0.55) HPGDMAPTKMT2ARAB9ANPC1
SCHEMBL29436270 0.84 ALDH1A1 (0.55) HPGDMAPTKMT2ARAB9ANPC1
SCHEMBL11219985 0.84 RAB9A (0.49) HPGDMAPTKMT2ARAB9ANPC1
SCHEMBL2983948 0.81 ALDH1A1 (0.67) HPGDMAPTKMT2ARAB9ANPC1
SCHEMBL29968097 0.81 ALDH1A1 (0.66) HPGDMAPTKMT2ARAB9ANPC1
SCHEMBL52178 0.81 ALDH1A1 (0.66) HPGDMAPTKMT2ARAB9ANPC1
SCHEMBL2992219 0.80 MEN1 (0.59) HPGDMAPTKMT2ARAB9ANPC1
SCHEMBL8376238 0.80 MAOB (0.48) HPGDMAPTKMT2ARAB9ANPC1
SCHEMBL4567092 0.79 NPC1 (0.59) HPGDMAPTKMT2ARAB9ANPC1
SCHEMBL19184746 0.79 KDM4E (0.51) HPGDMAPTKMT2ARAB9ANPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0636939-B1 Photoinitiator compositions and photosensitive materials using the same HITACHI CHEMICAL CO LTD (JP) 1999-03-03 EP disclosed
US-5811218-A IMPROVED PHOTOSENSITIVITY FOR MATERIALS CONTAINING POLYAMIC ACID AND ADDITION POLYMERIZABLE COMPOUND USED FOR PATTERN FORMATION HITACHI CHEMICAL COMPANY, LTD. (JP) 1998-09-22 US disclosed
EP-0636939-A2 Photoinitiator compositions and photosensitive materials using the same HITACHI CHEMICAL COMPANY, LTD. (JP) 1995-02-01 EP disclosed