SCHEMBL8376259

SCHEMBL8376259

CCCCN(CC(=O)O)c1ccc(C(=O)OCC)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 2/20 0.47
CA12 O43570 1/20 0.47
CA1 P00915 1/20 0.47
CA2 P00918 1/20 0.47
CA7 P43166 1/20 0.47
CA9 Q16790 1/20 0.47
ESR2 Q92731 1/20 0.47
CA14 Q9ULX7 1/20 0.47
LMNA P02545 5/20 0.46
CYP1A2 P05177 4/20 0.46
CYP3A4 P08684 4/20 0.46
MAOA P21397 1/20 0.46
GAA P10253 2/20 0.46
CYP2D6 P10635 2/20 0.46
CHRM2 P08172 1/20 0.46
HTR1A P08908 1/20 0.46
DRD3 P35462 1/20 0.46
SCN1A P35498 1/20 0.46
SLC6A3 Q01959 1/20 0.46
KCNH2 Q12809 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8373614 0.92 CA12 (0.50) ESR1CA12CA1CA2CA7
SCHEMBL8602388 0.90 ESR1 (0.54) ESR1CA12CA1CA2CA7
SCHEMBL8373743 0.87 L3MBTL1 (0.56) GAASMN1; SMN2NPC1RAB9APOLB
SCHEMBL8377309 0.85 CA12 (0.53) ESR1CA12CA1CA2CA7
SCHEMBL3347562 0.82 KEAP1 (0.46) GAASMN1; SMN2POLBALDH1A1EGFR
SCHEMBL10316801 0.81 ESR1 (0.45) ESR1CA12CA1CA2CA7
SCHEMBL58345 0.80 CA12 (0.53) ESR1CA12CA1CA2CA7
SCHEMBL3342781 0.79 CNR2 (0.48) ESR1GAANPC1RAB9ATP53
SCHEMBL8119057 0.78 CA12 (0.51) ESR1CA12CA1CA2CA7
SCHEMBL8373750 0.78 L3MBTL1 (0.49) CA12CA1CA2CA7CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0636939-B1 Photoinitiator compositions and photosensitive materials using the same HITACHI CHEMICAL CO LTD (JP) 1999-03-03 EP disclosed
US-5811218-A IMPROVED PHOTOSENSITIVITY FOR MATERIALS CONTAINING POLYAMIC ACID AND ADDITION POLYMERIZABLE COMPOUND USED FOR PATTERN FORMATION HITACHI CHEMICAL COMPANY, LTD. (JP) 1998-09-22 US disclosed
EP-0636939-A2 Photoinitiator compositions and photosensitive materials using the same HITACHI CHEMICAL COMPANY, LTD. (JP) 1995-02-01 EP disclosed