SCHEMBL8377309

SCHEMBL8377309

CCOC(=O)c1ccc(N(CC)CC(=O)O)cc1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA12 O43570 2/20 0.53
CA1 P00915 2/20 0.53
CA2 P00918 2/20 0.53
CA7 P43166 2/20 0.53
CA9 Q16790 2/20 0.53
CA14 Q9ULX7 2/20 0.53
ESR1 P03372 1/20 0.53
ESR2 Q92731 1/20 0.53
RAB9A P51151 6/20 0.52
SMN1; SMN2 Q16637 5/20 0.52
NPC1 O15118 4/20 0.52
TP53 P04637 1/20 0.52
POLB P06746 1/20 0.52
LMNA P02545 1/20 0.51
CYP1A2 P05177 1/20 0.51
CYP3A4 P08684 1/20 0.51
MAOA P21397 1/20 0.51
MEN1 O00255 3/20 0.50
KMT2A Q03164 3/20 0.50
GAA P10253 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL65692 0.89 CA12 (0.61) CA12CA1CA2CA7CA9
SCHEMBL8373614 0.88 CA12 (0.50) CA12CA1CA2CA7CA9
SCHEMBL8373779 0.86 MAPT (0.50) CA12CA1CA2CA7CA9
SCHEMBL8376259 0.85 ESR1 (0.47) CA12CA1CA2CA7CA9
SCHEMBL12106085 0.83 MEN1 (0.52) RAB9ASMN1; SMN2NPC1POLBLMNA
SCHEMBL8372700 0.83 CA12 (0.54) CA12CA1CA2CA7CA9
SCHEMBL10907589 0.82 ALDH1A1 (0.48) RAB9ANPC1POLBMEN1KMT2A
SCHEMBL4127840 0.82 ALDH1A1 (0.47) RAB9ASMN1; SMN2NPC1TP53POLB
SCHEMBL4397809 0.81 MAPT (0.47) ESR1SMN1; SMN2POLBLMNACYP1A2
SCHEMBL26558194 0.80 MAPT (0.61) RAB9ASMN1; SMN2NPC1TP53POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0636939-B1 Photoinitiator compositions and photosensitive materials using the same HITACHI CHEMICAL CO LTD (JP) 1999-03-03 EP disclosed
US-5811218-A IMPROVED PHOTOSENSITIVITY FOR MATERIALS CONTAINING POLYAMIC ACID AND ADDITION POLYMERIZABLE COMPOUND USED FOR PATTERN FORMATION HITACHI CHEMICAL COMPANY, LTD. (JP) 1998-09-22 US disclosed
EP-0636939-A2 Photoinitiator compositions and photosensitive materials using the same HITACHI CHEMICAL COMPANY, LTD. (JP) 1995-02-01 EP disclosed