Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 1/20 | 0.35 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.35 |
| ▸ | TP53 | P04637 | 2/20 | 0.33 |
| ▸ | CA4 | P22748 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | NPC1 | O15118 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | HPGD | P15428 | 1/20 | 0.31 |
| ▸ | RAB9A | P51151 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | LTA4H | P09960 | 2/20 | 0.30 |
| ▸ | NQO2 | P16083 | 1/20 | 0.30 |
| ▸ | POLB | P06746 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15249587 | 0.84 | ESR1 (0.37) | ESR1ESR2TP53MAPTKDM4E | |
| SCHEMBL3481489 | 0.83 | ESR1 (0.33) | ESR1ESR2TP53CA4MAPT | |
| SCHEMBL15249588 | 0.83 | ESR1 (0.33) | ESR1ESR2TP53MAPT | |
| SCHEMBL13089524 | 0.82 | ESR1 (0.31) | ESR1ESR2 | |
| SCHEMBL3481625 | 0.80 | ESR1 (0.34) | ESR1ESR2TP53MAPTKDM4E | |
| SCHEMBL10938874 | 0.80 | MAPT (0.35) | ESR1ESR2CA4MAPT | |
| SCHEMBL12230436 | 0.80 | ESR1 (0.39) | ESR1ESR2CA4MAPTALDH1A1 | |
| SCHEMBL13089131 | 0.80 | ESR1 (0.34) | ESR1ESR2CA4MAPT | |
| SCHEMBL11680664 | 0.80 | TP53 (0.37) | ESR1ESR2TP53MAPTKDM4E | |
| SCHEMBL3481678 | 0.79 | LTA4H (0.36) | ESR1ESR2TSHRLTA4H |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115181223-B | Low-gloss matte auxiliary agent, preparation method thereof and molded body | 铨盛聚碳科技股份有限公司 | 2023-08-29 | — | — | CN | claimed |
| CN-115181223-B | Low-gloss matte auxiliary agent, preparation method thereof and molded body | 铨盛聚碳科技股份有限公司 | 2023-08-29 | — | — | CN | disclosed |
| CN-115181223-A | Low-gloss matte auxiliary agent, preparation method thereof and formed body | 铨盛聚碳科技股份有限公司 | 2022-10-14 | — | — | CN | disclosed |
| CN-114085382-A | Hydrogen-containing poly titanium boron siloxane flame retardant, and preparation method and application thereof | 铨盛聚碳科技股份有限公司 | 2022-02-25 | — | — | CN | disclosed |
| US-9932475-B2 | Temperature-resistant silicone resins | THE BOEING COMPANY (US) | 2018-04-03 | — | — | US | disclosed |
| US-9546237-B2 | Stabilization of polymers that contain a hydrolyzable functionality | BRIDGESTONE CORPORATION (JP) | 2017-01-17 | — | — | US | disclosed |
| EP-2128897-B1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LTD (JP) | 2015-05-06 | — | — | EP | disclosed |
| US-8716209-B2 | Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2014-05-06 | — | — | US | disclosed |
| EP-1904415-B1 | HYDROPHOBING MINERALS AND FILLER MATERIALS | DOW CORNING (US) | 2014-03-12 | — | — | EP | disclosed |
| US-20130331520-A1 | STABILIZATION OF POLYMERS THAT CONTAIN A HYDROLYZABLE FUNCTIONALITY | BRIDGESTONE CORPORATION (JP) | 2013-12-12 | — | — | US | disclosed |
| US-20080286474-A1 | Hydrophobing Minerals and Filler Materials | DOW SILICONES CORPORATION | 2008-11-20 | — | — | US | disclosed |
| EP-1904415-A2 | HYDROPHOBING MINERALS AND FILLER MATERIALS | Dow Corning Corporation (US) | 2008-04-02 | — | — | EP | disclosed |
| WO-2007009935-A2 | HYDROPHOBING MINERALS AND FILLER MATERIALS | DOW CORNING CORPORATION (US) | 2007-01-25 | — | — | WO | disclosed |
| EP-0292260-B1 | Process for producing 1,3-bis(dicarboxyphenyl)-disiloxane derivative or dianhydride thereof | HITACHI CHEMICAL CO LTD (JP) | 1994-04-13 | — | — | EP | disclosed |
| US-5242917-A | Curing agents for epoxy resins | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1993-09-07 | — | — | US | disclosed |
| EP-0320211-B1 | PROCESS FOR PRODUCING A TETRACARBOXYLIC ACID ANHYDRIDE HAVING DISILOXANE LINKAGE | Hitachi Chemical Co., Ltd. (JP) | 1993-06-16 | — | — | EP | disclosed |
| US-5166363-A | Process for producing 1,3-bis(dicarboxyphenyl)-disiloxane derivative or dianhydride thereof | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1992-11-24 | — | — | US | disclosed |
| EP-0320211-A2 | Process for producing a tetracarboxylic acid anhydride having disiloxane linkage | Hitachi Chemical Co., Ltd. (JP) | 1989-06-14 | — | — | EP | disclosed |
| US-4831091-A | USING A COORDINATION CATALYST CONTAINING A SILANETRIOL OR -DIOL AS WELL AS AN AROMATIC ESTSER; ODORLESS; STEREOSPECIFIC; PARTICLE SIZES | CHISSO CORPORATION (JP) | 1989-05-16 | — | — | US | disclosed |
| EP-0292260-A2 | Process for producing 1,3-bis(dicarboxyphenyl)-disiloxane derivative or dianhydride thereof | Hitachi Chemical Co., Ltd. (JP) | 1988-11-23 | — | — | EP | disclosed |