SCHEMBL8385248

SCHEMBL8385248

C=COCCOC(=O)c1ccc(O)cc1

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 4/20 0.59
TSHR P16473 2/20 0.59
ALDH1A1 P00352 2/20 0.59
CHRM1 P11229 1/20 0.59
SLC6A2 P23975 1/20 0.59
KDR P35968 1/20 0.59
TDP1 Q9NUW8 1/20 0.59
ESR2 Q92731 3/20 0.57
LMNA P02545 3/20 0.56
SMN1; SMN2 Q16637 2/20 0.56
CYP2D6 P10635 2/20 0.56
MAPK1 P28482 2/20 0.56
CYP1A2 P05177 1/20 0.56
CYP2C19 P33261 1/20 0.56
NR1H2 P55055 1/20 0.56
RNASEL Q05823 1/20 0.56
MEN1 O00255 2/20 0.53
KMT2A Q03164 2/20 0.53
CA12 O43570 2/20 0.53
CA1 P00915 2/20 0.53

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6067577 0.93 ESR1 (0.47) ESR1TSHRALDH1A1CHRM1SLC6A2
SCHEMBL17425944 0.87 ESR1 (0.53) ESR1TSHRALDH1A1CHRM1SLC6A2
SCHEMBL10773147 0.86 TDP1 (0.46) ESR1TSHRALDH1A1CHRM1SLC6A2
SCHEMBL132567 0.85 ESR1 (0.77) ESR1TSHRALDH1A1CHRM1SLC6A2
SCHEMBL12376808 0.85 ESR1 (0.41) ESR1TSHRALDH1A1CHRM1SLC6A2
SCHEMBL13567324 0.85 RAB9A (0.47) ESR1TSHRALDH1A1CHRM1SLC6A2
SCHEMBL2978166 0.84 TDP1 (0.61) ESR1TSHRALDH1A1SLC6A2TDP1
SCHEMBL4578978 0.83 ESR1 (0.59) ESR1TSHRALDH1A1CHRM1SLC6A2
SCHEMBL15865003 0.82 TDP1 (0.53) ESR1TSHRALDH1A1CHRM1SLC6A2
SCHEMBL1131138 0.82 TDP1 (0.58) ESR1TSHRALDH1A1CHRM1SLC6A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2135739-A2 Relief printing plate precursor for laser engraving, relief printing plate, and process for producing relief printing plate FUJIFILM Corporation (JP) 2009-12-23 EP disclosed
US-6001932-A ACRYLIC ESTER COPOLYMER WITH VINYL ETHER, VINYL ESTER COPOLYMERS FOR RUBBER BLENDS NIPPON MEKTRON, LIMITED (JP) 1999-12-14 US disclosed
EP-0761702-B1 Novel acrylic copolymer elastomer, its blend rubber and blend rubber composition NIPPON MEKTRON KK (JP) 1999-10-27 EP disclosed
EP-0755952-B1 Acrylic copolymer elastomer, its blend rubber and blend rubber composition NIPPON MEKTRON KK (JP) 1999-10-20 EP disclosed
US-5959037-A IMPROVED COLD RESISTANCE AND AN INTERMEDIATE HEAT RESISTANCE BETWEEN THE HEAT RESISTANCE OF ACRYLIC COPOLYMER ELASTOMER AND THAT OF FLUORINE-CONTAINING ELASTOMER WHEN BLENDED WITH THE FLUORINE-CONTAINING ELASTOMER NIPPON MEKTRON, LIMITED (JP) 1999-09-28 US disclosed
US-5744562-A GOOD HEAT RESISTANCE AND AMINE RESISTANCE WITH FLUORINE-CONTAINING ELASTOMER NIPPON MEKTRON, LIMITED (JP) 1998-04-28 US disclosed
EP-0761702-A2 Novel acrylic copolymer elastomer, its blend rubber and blend rubber composition NIPPON MEKTRON, LTD. (JP) 1997-03-12 EP disclosed
EP-0755952-A2 Acrylic copolymer elastomer, its blend rubber and blend rubber composition NIPPON MEKTRON, LTD. (JP) 1997-01-29 EP disclosed