Known targets — ChEMBL curated mechanism
GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQ
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bromide SCHEMBL8425132 | 0.89 | — | — | |
| Fluoride Ion SCHEMBL31683058 | 0.89 | — | — | |
| Hydrochloric Acid SCHEMBL6846743 | 0.89 | — | — | |
| Iodide SCHEMBL10651168 | 0.89 | — | — | |
| Bromide SCHEMBL28280108 | 0.80 | — | — | |
| SCHEMBL1717772 | 0.77 | TSHR (0.38) | — | |
| Water SCHEMBL2310255 | 0.74 | — | — | |
| SCHEMBL4452545 | 0.74 | — | — | |
| Water SCHEMBL7125489 | 0.74 | — | — | |
| Potassium Ion SCHEMBL28275731 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260071095-A1 | POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE | FUJIMI INCORPORATED (JP) | 2026-03-12 | — | — | US | disclosed |
| US-20250320381-A1 | POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | FUJIMI INCORPORATED (JP) | 2025-10-16 | — | — | US | disclosed |
| US-20250282977-A1 | POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | FUJIMI INCORPORATED (JP) | 2025-09-11 | — | — | US | disclosed |
| US-12012658-B2 | Composition, kit, and method for treating substrate | FUJIFILM CORPORATION (JP) | 2024-06-18 | — | — | US | disclosed |
| CN-115411454-B | Lithium battery diaphragm and preparation method thereof | 深圳市成晟新能源技术有限公司 | 2023-12-19 | — | — | CN | disclosed |
| US-20220119960-A1 | COMPOSITION, KIT, AND METHOD FOR TREATING SUBSTRATE | FUJIFILM CORPORATION (JP) | 2022-04-21 | — | — | US | disclosed |
| US-11085011-B2 | Post CMP cleaning compositions for ceria particles | ENTEGRIS, INC. (US) | 2021-08-10 | — | — | US | disclosed |
| CN-112771144-A | POST chemical mechanical polishing (POST CMP) cleaning composition for cerium particles | 恩特格里斯公司 | 2021-05-07 | — | — | CN | disclosed |
| WO-2021005980-A1 | COMPOSITION, KIT, AND TREATMENT METHOD FOR SUBSTRATE | 富士フイルム株式会社 | 2021-01-14 | — | — | WO | disclosed |
| WO-2020046539-A1 | POST CMP CLEANING COMPOSITIONS FOR CERIA PARTICLES | ENTEGRIS, INC. (US) | 2020-03-05 | — | — | WO | disclosed |
| US-20200071642-A1 | POST CMP CLEANING COMPOSITIONS FOR CERIA PARTICLES | MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT | 2020-03-05 | — | — | US | disclosed |
| US-5922826-A | TRANSESTERIFICATION IN PRESENCE OF A POLYMERIZATION CATALYST CONTAINING AN ORGANONITROGEN COMPOUND AND A QUATERNARY PHOSPHONIUM SALT TO PRODUCE POLYCARBONATE | IDEMITSU KOSAN CO., LTD. (JP) | 1999-07-13 | — | — | US | disclosed |
| EP-0807657-A1 | PROCESS FOR PRODUCING POLYCARBONATE | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1997-11-19 | — | — | EP | disclosed |