SCHEMBL83996

SCHEMBL83996

C=CCN(CC=C)c1ccccc1C(=O)c1ccccc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AKR1C3 P42330 1/20 0.46
MAPT P10636 3/20 0.43
GAA P10253 2/20 0.43
ALDH1A1 P00352 5/20 0.43
LMNA P02545 1/20 0.43
HPGD P15428 1/20 0.43
PTPN1 P18031 1/20 0.42
LSS P48449 2/20 0.41
TSHR P16473 2/20 0.41
TP53 P04637 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
AKT1 P31749 1/20 0.39
GABRP O00591 1/20 0.38
GABRD O14764 1/20 0.38
GABRA1 P14867 1/20 0.38
GABRB1 P18505 1/20 0.38
GABRG2 P18507 1/20 0.38
GABRB3 P28472 1/20 0.38
GABRA5 P31644 1/20 0.38
GABRA3 P34903 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzophenone SCHEMBL27852184 0.98 ALDH1A1 (0.45) AKR1C3MAPTGAAALDH1A1LMNA
SCHEMBL89548 0.90 ALDH1A1 (0.50) MAPTGAAALDH1A1LMNAHPGD
SCHEMBL89549 0.88 AKR1C3 (0.41) AKR1C3MAPTGAAALDH1A1LMNA
SCHEMBL28431721 0.87 NR3C1 (0.40) AKR1C3MAPTGAAALDH1A1LMNA
SCHEMBL11767364 0.86 AKR1C3 (0.44) AKR1C3MAPTGAAALDH1A1LMNA
SCHEMBL11767370 0.85 AKR1C3 (0.45) AKR1C3ALDH1A1LMNAHPGDPTPN1
SCHEMBL278676 0.85 PTPN1 (0.47) MAPTALDH1A1HPGDPTPN1TSHR
SCHEMBL9329272 0.84 TSHR (0.44) AKR1C3MAPTGAAALDH1A1LMNA
Hydrochloric Acid SCHEMBL27897977 0.83 PTPN1 (0.46) MAPTALDH1A1HPGDPTPN1TSHR
SCHEMBL2521366 0.82 PTPN1 (0.38) MAPTALDH1A1LMNAHPGDPTPN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 592 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024142487-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, AND METHOD FOR PRODUCING WIRING BOARD 株式会社レゾナック 2024-07-04 WO claimed
WO-2024134889-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING PRINTED WIRING BOARD 株式会社レゾナック 2024-06-27 WO claimed
WO-2024135574-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING PRINTED WIRING BOARD 株式会社レゾナック 2024-06-27 WO claimed
WO-2024009870-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING SEMICONDUCTOR PACKAGE OR RINTED WIRING BOARD 株式会社レゾナック 2024-01-11 WO claimed
WO-2024009432-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING SEMICONDUCTOR PACKAGE SUBSTATE OR PRINTED WIRING BOARD 株式会社レゾナック 2024-01-11 WO claimed
CN-115729035-A Transfer film for vapor deposition mask formation and method for manufacturing vapor deposition mask 富士胶片株式会社 2023-03-03 CN claimed
EP-2975091-B1 ACTIVE ENERGY RAY-CURABLE OFFSET PRINTING INK COMPOSITION SAKATA INX CORP (JP) 2019-06-05 EP claimed
US-9453136-B2 Active energy ray-curable offset printing ink composition SAKATA INX CORPORATION (JP) 2016-09-27 US claimed
US-20160017159-A1 ACTIVE ENERGY RAY-CURABLE OFFSET PRINTING INK COMPOSITION SAKATA INX CORPORATION (JP) 2016-01-21 US claimed
EP-2975091-A1 ACTIVE ENERGY RAY-CURABLE OFFSET PRINTING INK COMPOSITION Sakata INX Corp. (JP) 2016-01-20 EP claimed
US-7348131-B2 Photosensitive polymeric binder, free radical polymerizable (meth)acrylate monomer or oligomer, free radical initiator, sensitizing dye and water soluble overcoat are exposed and hardened; rinsing; removing overcoat; developing exposed and deactivated plate with both ink and fountain solution; durability TENG GARY GANGHUI 2008-03-25 US claimed
US-20070172765-A1 Laser sensitive lithographic printing plate having specific photopolymer composition TENG GARY G 2007-07-26 US claimed
US-20070009829-A1 Photosensitive polymeric binder, free radical polymerizable (meth)acrylate monomer or oligomer, free radical initiator, sensitizing dye and water soluble overcoat are exposed and hardened; rinsing; removing overcoat; developing exposed and deactivated plate with both ink and fountain solution; durability TENG GARY G 2007-01-11 US claimed
US-20040134604-A1 Method of producing a laminated structure 3M INNOVATIVE PROPERTIES COMPANY 2004-07-15 US claimed
US-20020066528-A1 Method of producing a laminated structure 3M INNOVATIVE PROPERTIES COMPANY 2002-06-06 US claimed
US-20020062919-A1 Providingstructure comprising at least two layers and a photopolymerizable adhesive between layers; directing actinic radiation within identified spectral region to cure photopolymerizable adhesive and form laminate structure 3M INNOVATIVE PROPERTIES COMPANY 2002-05-30 US claimed
EP-1200533-A1 METHOD OF PRODUCING A LAMINATED STRUCTURE 3M Innovative Properties Company (US) 2002-05-02 EP claimed
WO-2001009262-A1 METHOD OF PRODUCING A LAMINATED STRUCTURE 3M INNOVATIVE PROPERTIES COMPANY (US) 2001-02-08 WO claimed
US-4837106-A Recording materials containing photopolymerizable composition and component capable of causing a color reaction in microcapsules FUJI PHOTO FILM CO., LTD. (JP) 1989-06-06 US claimed
US-4440846-A Photocopy sheet employing encapsulated radiation sensitive composition and imaging process MEAD CORPORATION (US) 1984-04-03 US claimed