SCHEMBL89549

SCHEMBL89549

C=CCN(CC=C)c1cccc(C(=O)c2ccccc2)c1N(CC=C)CC=C

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AKR1C3 P42330 1/20 0.41
ALDH1A1 P00352 3/20 0.39
LMNA P02545 1/20 0.39
HPGD P15428 1/20 0.39
MAPT P10636 2/20 0.39
GAA P10253 1/20 0.39
LSS P48449 2/20 0.38
PTPN1 P18031 1/20 0.37
TSHR P16473 1/20 0.36
ATM Q13315 2/20 0.36
TDP1 Q9NUW8 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
GABRP O00591 1/20 0.35
GABRD O14764 1/20 0.35
GABRA1 P14867 1/20 0.35
GABRB1 P18505 1/20 0.35
GABRG2 P18507 1/20 0.35
GABRB3 P28472 1/20 0.35
GABRA5 P31644 1/20 0.35
GABRA3 P34903 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL83996 0.88 AKR1C3 (0.46) AKR1C3ALDH1A1LMNAHPGDMAPT
Benzophenone SCHEMBL27852184 0.87 ALDH1A1 (0.45) AKR1C3ALDH1A1LMNAHPGDMAPT
SCHEMBL28431721 0.84 NR3C1 (0.40) AKR1C3ALDH1A1LMNAHPGDMAPT
SCHEMBL11767370 0.83 AKR1C3 (0.45) AKR1C3ALDH1A1LMNAHPGDLSS
SCHEMBL28278314 0.80 HPGD (0.47) ALDH1A1LMNAHPGDMAPTGAA
SCHEMBL89548 0.78 ALDH1A1 (0.50) ALDH1A1LMNAHPGDMAPTGAA
Benzene SCHEMBL28126416 0.78 ALDH1A1 (0.45) AKR1C3ALDH1A1HPGDMAPTGAA
SCHEMBL31320037 0.78 ALDH1A1 (0.45) AKR1C3ALDH1A1HPGDMAPTGAA
SCHEMBL166161 0.78 ALDH1A1 (0.45) AKR1C3ALDH1A1HPGDMAPTGAA
SCHEMBL278676 0.77 PTPN1 (0.47) ALDH1A1HPGDMAPTPTPN1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 227 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115708016-A Photosensitive resin composition, photocured product of the composition, and printed wiring board having photocured film of the composition 株式会社田村制作所 2023-02-21 CN claimed
US-7534839-B2 Sequentially terminated elastomers BRIDGESTONE CORPORATION (JP) 2009-05-19 US claimed
JP-2007500281-A 2007-01-11 JP claimed
US-20060135701-A1 Hysteresis elastomeric compositions comprising sequentially terminated polymers BRIDGESTONE CORPORATION (JP) 2006-06-22 US claimed
EP-1631596-A1 IMPROVED HYSTERESIS ELASTOMERIC COMPOSITIONS COMPRISING SEQUENTIALLY TERMINATED POLYMERS Bridgestone Corporation (JP) 2006-03-08 EP claimed
WO-2004111094-A1 IMPROVED HYSTERESIS ELASTOMERIC COMPOSITIONS COMPRISING SEQUENTIALLY TERMINATED POLYMERS BRIDGESTONE CORPORATION (JP) 2004-12-23 WO claimed
EP-0203393-B1 CURABLE COMPOSITION Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1989-07-12 EP claimed
US-4778859-A Tetramine derived polyimide with pendant unsaturation, and various photosensitive compositions therefrom ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1988-10-18 US claimed
EP-0203393-A1 Curable composition Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1986-12-03 EP claimed
JP-6003820-A None JP disclosed
JP-54014489-A None JP disclosed
CN-118159908-A Photosensitive element and method for forming resist pattern 旭化成株式会社 2024-06-07 CN disclosed
EP-4378928-A1 NAPHTHALENE DITHIOL AND DERIVATIVE THEREOF, AND PRODUCTION METHODS AND USES FOR SAME SUGAI CHEMICAL INDUSTRY CO., LTD. (JP) 2024-06-05 EP disclosed
CN-117882497-A Adhesive film for circuit connection, circuit connection structure, and method for producing same 株式会社力森诺科 2024-04-12 CN disclosed
EP-0126029-A2 Image-forming process CIBA-GEIGY AG (CH) 1984-11-21 EP disclosed
EP-0102921-A2 Process for making images from liquid substances CIBA-GEIGY AG (CH) 1984-03-14 EP disclosed
US-4276352-A Reinforced composites containing unsaturated polyimide resins CIBA-GEIGY CORPORATION (US) 1981-06-30 US disclosed
US-4254012-A Reinforced composites containing cyanato resins CIBA-GEIGY CORPORATION (US) 1981-03-03 US disclosed
US-4252593-A Method of preparing reinforced composites CIBA-GEIGY CORPORATION (US) 1981-02-24 US disclosed
JP-S5414489-A PHOTOSENSITIZER TORAY IND INC 1979-02-02 JP disclosed