SCHEMBL8400899

SCHEMBL8400899

COc1c(C)cc(S(=O)(=O)c2cc(C)c(OC)c(C)c2)cc1C

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.43
TSHR P16473 1/20 0.43
MAPK1 P28482 1/20 0.43
PKM P14618 2/20 0.43
NAMPT P43490 2/20 0.41
ALDH1A1 P00352 2/20 0.40
RAPGEF4 Q8WZA2 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
GAA P10253 2/20 0.37
NR3C1 P04150 1/20 0.36
NR3C2 P08235 1/20 0.36
ACHE P22303 1/20 0.36
LMNA P02545 2/20 0.35
TDP1 Q9NUW8 1/20 0.35
PTGS1 P23219 1/20 0.35
PTGS2 P35354 1/20 0.35
FFAR4 Q5NUL3 1/20 0.35
CA12 O43570 1/20 0.35
CA1 P00915 1/20 0.35
CA2 P00918 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8400894 0.94 NAMPT (0.41) POLBTSHRMAPK1PKMNAMPT
SCHEMBL8495335 0.90 NAMPT (0.43) POLBTSHRMAPK1PKMNAMPT
SCHEMBL14700563 0.85 MAPT (0.44) POLBPKMNAMPTALDH1A1SMN1; SMN2
SCHEMBL9480049 0.82 CA1 (0.49) ALDH1A1SMN1; SMN2PTGS1PTGS2CA12
SCHEMBL5212407 0.82 ALDH1A1 (0.38) ALDH1A1RAPGEF4SMN1; SMN2NR3C1NR3C2
SCHEMBL16308957 0.82 ALDH1A1 (0.42) TSHRNAMPTALDH1A1RAPGEF4SMN1; SMN2
SCHEMBL6540687 0.79 HTR6 (0.55) TSHRMAPK1PKMNAMPTCA12
SCHEMBL12770805 0.78 NAMPT (0.32) NAMPTALDH1A1
SCHEMBL5095441 0.76 POLB (0.59) POLBTSHRMAPK1ALDH1A1SMN1; SMN2
SCHEMBL11564130 0.74 CA2 (0.46) POLBTSHRMAPK1PKMPTGS2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8722840-B2 Resist underlayer film forming composition, and method for forming resist pattern using the same NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2014-05-13 US disclosed
US-20130230809-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN USING THE SAME NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2013-09-05 US disclosed
US-20120129076-A1 Novel Sulfonic Acid Group-Containing Segmented Block Copolymer and Use Thereof TOYO BOSEKI KABUSHIKI KAISHA (JP) 2012-05-24 US disclosed
WO-2011118845-A1 POLYESTER RESIN, AND OPTICAL MATERIALS, FILMS AND IMAGE DISPLAY DEVICES USING THE SAME FUJIFILM CORPORATION (JP) 2011-09-29 WO disclosed
US-7635181-B2 Ink for ink jet-recording curable through irradiation with a radioactive ray and method for preparing lithographic printing plates using the same FUJIFILM CORPORATION (JP) 2009-12-22 US disclosed
US-7635181-B2 Ink for ink jet-recording curable through irradiation with a radioactive ray and method for preparing lithographic printing plates using the same FUJIFILM CORPORATION (JP) 2009-12-22 US disclosed
US-7306894-B2 Polymerizable composition, photopolymerizing method and process for producing lithographic printing plate using the polymerizable composition FUJIFILM CORPORATION (JP) 2007-12-11 US disclosed
US-7306894-B2 Polymerizable composition, photopolymerizing method and process for producing lithographic printing plate using the polymerizable composition FUJIFILM CORPORATION (JP) 2007-12-11 US disclosed