SCHEMBL1058293

SCHEMBL1058293

CCCC(=O)OCC1CCCCC1

nearest known ligand 0.68

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.68
NAAA Q02083 2/20 0.42
NLRP3 Q96P20 1/20 0.42
ALDH1A1 P00352 1/20 0.41
MEN1 O00255 1/20 0.40
MAPT P10636 1/20 0.40
KMT2A Q03164 1/20 0.40
ATM Q13315 1/20 0.40
POLB P06746 1/20 0.39
EPHX2 P34913 1/20 0.38
SLC1A3 P43003 2/20 0.38
SLC1A2 P43004 2/20 0.38
SLC1A1 P43005 2/20 0.38
CYP1A2 P05177 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8335902 0.90 LMNA (0.53) LMNANLRP3ALDH1A1POLB
SCHEMBL420322 0.90 LMNA (0.53) LMNANLRP3ALDH1A1POLB
SCHEMBL13369423 0.89 LMNA (0.64) LMNANAAAPOLBEPHX2CYP1A2
SCHEMBL9208258 0.88 LMNA (0.85) LMNAALDH1A1MEN1MAPTKMT2A
SCHEMBL30581341 0.87 LMNA (0.61) LMNANAAAPOLBEPHX2
SCHEMBL12133169 0.87 LMNA (0.71) LMNAALDH1A1MEN1MAPTKMT2A
SCHEMBL15987738 0.86 NAAA (0.61) LMNANAAA
SCHEMBL6536448 0.86 NAAA (0.61) LMNANAAA
Butane SCHEMBL2854155 0.86 LMNA (0.87) LMNANAAAALDH1A1MEN1MAPT
SCHEMBL4625911 0.86 NAAA (0.61) LMNANAAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8563219-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-10-22 US disclosed
US-8530137-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-10 US disclosed
US-8530137-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-10 US disclosed
US-20120219909-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-08-30 US disclosed
EP-1730152-B1 TETRAHYDROQUINOLINE DERIVATIVES AND A PROCESS FOR PREPARING THE SAME MITSUBISHI TANABE PHARMA CORP (JP) 2012-05-02 EP disclosed
US-8158640-B2 Tetrahydroquinoline derivatives and a process for preparing the same MITSUBISHI TANABE PHARMA CORPORATION (JP) 2012-04-17 US disclosed
US-20110200935-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-08-18 US disclosed
US-20110200935-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-08-18 US disclosed
US-20110039828-A1 TETRAHYDROQUINOLINE DERIVATIVES AND A PROCESS FOR PREPARING THE SAME MITSUBISHI TANABE PHARMA CORPORATION (JP) 2011-02-17 US disclosed
US-7872126-B2 Tetrahydroquinoline derivatives and a process for preparing the same MITSUBISHI TANABE PHARMA CORPORATION (JP) 2011-01-18 US disclosed
EP-2217564-A1 COMPLEX PANTOIC ACID ESTER NEOPENTYL SULFONYL ESTER CYCLIZATION RELEASE PRODRUGS OF ACAMPROSATE, COMPOSITIONS THEREOF, AND METHODS OF USE XenoPort, Inc. (US) 2010-08-18 EP disclosed
US-20090076147-A1 COMPLEX PANTOIC ACID ESTER NEOPENTYL SULFONYL ESTER CYCLIZATION RELEASE PRODRUGS OF ACAMPROSATE, COMPOSITIONS THEREOF, AND METHODS OF USE XENOPORT, INC. 2009-03-19 US disclosed
WO-2009033054-A1 COMPLEX PANTOIC ACID ESTER NEOPENTYL SULFONYL ESTER CYCLIZATION RELEASE PRODRUGS OF ACAMPROSATE, COMPOSITIONS THEREOF, AND METHODS OF USE XENOPORT, INC. (US) 2009-03-12 WO disclosed
US-20070082896-A1 Tetrahydroquinoline derivatives and a process for preparing the same TANABE SEIYAKU CO., LTD. 2007-04-12 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20070082896-A1 Tetrahydroquinoline derivatives and a process for preparing the same CETP, MTTP, NPC1L1 LMNA 2304/4885NAAA 1724/4885NLRP3 461/4885
US-20110200935-A1 PHOTORESIST COMPOSITION C1R, F12, C1S LMNA 2664/4885NAAA 645/4885NLRP3 3668/4885
US-20090076147-A1 COMPLEX PANTOIC ACID ESTER NEOPENTYL SULFONYL ESTER CYCLIZATION RELEASE PRODRUGS OF ACAMPROSATE, COMPOSITIONS THEREOF, AND METHODS OF USE ADSL, SLC19A1, SLC25A21 LMNA 2544/4885NAAA 171/4885NLRP3 3641/4885
US-20110039828-A1 TETRAHYDROQUINOLINE DERIVATIVES AND A PROCESS FOR PREPARING THE SAME CETP, MTTP, NPC1L1 LMNA 2304/4885NAAA 1724/4885NLRP3 461/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.